11.
    实用新型
    失效

    公开(公告)号:JPS50106648U

    公开(公告)日:1975-09-02

    申请号:JP11339773

    申请日:1973-09-29

    12.
    发明专利
    失效

    公开(公告)号:JPS5021075B1

    公开(公告)日:1975-07-19

    申请号:JP3218473

    申请日:1973-03-20

    ELECTRON BEAM FOCUSING DEVICE AND ELECTRONIC DEVICE PROVIDED WITH THE SAME

    公开(公告)号:JP2000090851A

    公开(公告)日:2000-03-31

    申请号:JP26025098

    申请日:1998-09-14

    Applicant: SONY CORP

    Inventor: ICHIDA KOUSUKE

    Abstract: PROBLEM TO BE SOLVED: To reduce a crossover diameter, consequently reduce an electron beam spot diameter on a plane of projection and lengthen the life of a cathode. SOLUTION: A first electron beam 20 emitted from a cathode 11 is converted into light by a phosphor film 31 provided on an emittance conversion element 21. The converted light is converted into a second electron beam 25 emitted perpendicularly to a plane of a photo cathode film 34 by the photo cathode film 34. A diameter of a crossover 24 is determined by only sum of aberration of an electric field lens formed of second grids 22, 23 and an electronic repulsion effect, a spot size of second electron beam 25 on a plane of projection is made smaller and the life of the cathode 11 is lengthened.

    ELECTRONNBEAM EQUIPMENT
    16.
    发明专利

    公开(公告)号:JPS5481063A

    公开(公告)日:1979-06-28

    申请号:JP14899277

    申请日:1977-12-12

    Inventor: ISOBE MORIYUKI

    Abstract: PURPOSE:To make an alignment of an object lens through only electrical adjustments without accompanying with mechanical adjustments not by providing a stop, etc., for preventing an electron beam from passing through to the center of the magnetic field of the object lens, but by providing a stop plate and electron-beam deflecting method to the upper part of it. CONSTITUTION:Electron beam 2 focuses on the 1st focal poing O1 through electron lens 3 at the 1st stage and the electron-beam image at this point O1 is formed on the surface of sample 5 through object lens 4 at the 2nd stage. Deflecting coils 8 and 9 at two stages constitute the aligning deflecting method which leads an electron beam generated by the electron gun in the caliber direction of stop plate 6; and aligning coil 10 under stop plate 6 is for allowing the center line of the electron beam having passed through stop plate 6 to penetrate center O2 of the lens magnetic field of object lens 4, and two-stage deflecting coils 11 and 12 under it are for shifting the sample irradiation position of the electron beam. In this equipment, the alignment of the object lens is fulfilled through adjustments of variable DC power supply 14 exciting deflecting coil 10.

    18.
    发明专利
    失效

    公开(公告)号:JPS5020432B1

    公开(公告)日:1975-07-15

    申请号:JP8018368

    申请日:1968-10-29

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