公开(公告)号：JP5141459B2

公开(公告)日：2013-02-13

申请号：JP2008232552

申请日：2008-09-10

Applicant: Jsr株式会社

Inventor： 琢磨 江畑 ,  大樹 中川 ,  恭彦 松田 ,  一樹 笠原 ,  賢二 星子

IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of achieving large depth of focus, small LWR and MEEF, excellent characteristic for preventing the occurrence of pattern collapse, and excellent performance for preventing the occurrence of defect in development. SOLUTION: This radiation sensitive resin composition contains a resin (A), a radiation sensitive acid generator (B), an acid diffusion inhibitor (C), and a solvent (D). The resin (A) is a polymer having a repeating unit (a-1) having a cyclic carbonic ester structure on a side chain. The acid diffusion inhibitor (C) is a nitrogen-containing compound having a specific structure. COPYRIGHT: (C)2010,JPO&INPIT

公开(公告)号：JP5560854B2

公开(公告)日：2014-07-30

申请号：JP2010084496

申请日：2010-03-31

Applicant: Jsr株式会社

Inventor： 昌史 吉田 ,  浩光 中島 ,  一樹 笠原 ,  一雄 中原 ,  誠 杉浦

IPC: G03F7/039 ,  C08F20/10 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having excellent resolution performance and forming a chemically amplifying type resist having a small MEEF and a small LWR, and also to provide a polymer used therefor.SOLUTION: The radiation sensitive resin composition has a polymer (A) having an alicyclic hydrocarbon group at a terminal of a molecular chain and a repeating unit represented by formula (1) and a solvent (B).