LINEAR AROMATIC POLYMER, ITS MANUFACTURING METHOD AND COATING FLUID FOR FORMING INSULATING FILM

    公开(公告)号:JP2002020482A

    公开(公告)日:2002-01-23

    申请号:JP2000203650

    申请日:2000-07-05

    Abstract: PROBLEM TO BE SOLVED: To obtain a linear aromatic polymer which comprises a thermosetting resin curable through a crosslinking reaction even at 280 deg.C or below, and can be used as a material for an interlayer insulating film, to provide its manufacturing method, and to obtain a coating liquid which can form an insulating film excellent in chemical resistance. SOLUTION: The linear aromatic polymer has a structure wherein a functional group represented by formula (1) is directly bonded to an aromatic ring. The manufacturing method involves the steps of metallizing the polymer and then subjecting a compound represented by formula (4) to substitution reaction. The coating liquid for forming an insulating film contains the aromatic polymer. In the formulas, A is C or Si; B1, B2 and B3 are each a 2-10C alkenyl, alkynyl, a 1-10C alkyl, methoxy, ethoxy or phenyl, provided that at least two of B1, B2 and B3 are each a 2-10C aklkenyl or alkynyl; and X is a halogen atom.

    MODIFIED CYANATE ESTER RESIN VANISH FOR PRINTED CIRCUIT BOARD AND PREPARATION THEREOF

    公开(公告)号:JPH1121506A

    公开(公告)日:1999-01-26

    申请号:JP18114397

    申请日:1997-07-07

    Abstract: PROBLEM TO BE SOLVED: To obtain a vanish having a low dielectric loss tangent, by reacting respective specific amounts of a cyanate ester type compound and a phenolic compound, in the presence of a metal-containing reaction catalyst, in a solution of a polyphenylene ether resin in an aromatic hydrocarbon type solvent prepared by heating and dissolution of the resin in the solvent, to thereby produce a solution of a uniform blend of resins, and then adding with agitation a ketone type solvent into the resulting solution to thereby form a suspension of the uniform blend of resins. SOLUTION: In a solution which has been prepared by heating and dissolving a polyphenylene ether resin in an aromatic hydrocarbon type solvent, a cyanate ester type compound of formula I and a phenolic compound of formula II are reacted in the presence of a metal-containing reaction catalyst (for example, cobalt naphthenate), to thereby produce a solution in which a uniform blend of a modified cyanate ester resin and a polyphenylene ether resin is dissolved. A ketone type solvent is then added to the solution with agitation to produce a suspension of the above uniform blend of resins. In above formulae, R1 is -CH2 -, -CH(CH3 )- or the like; R2 and R3 are each is H or CH3 ; and R4 is CH3 , C2 H5 or CH2 -CH(CH3 )3 .

    MODIFIED CYANATE ESTER RESIN VANISH FOR PRINTED CIRCUIT BOARD AND PREPARATION THEREOF

    公开(公告)号:JPH1121504A

    公开(公告)日:1999-01-26

    申请号:JP17957197

    申请日:1997-07-04

    Abstract: PROBLEM TO BE SOLVED: To obtain a vanish having a low dielectric constant, by reacting respective specific amounts of a cyanate ester type compound and a phenolic compound, in the presence of a metal-containing reaction catalyst, in a solution of a polyphenylene ether resin in an aromatic hydrocarbon type solvent prepared by heating and dissolution of the resin in the solvent, to thereby produce a solution of a uniform blend of resins, and then adding with agitation a ketone type solvent into the resulting solution to thereby form a suspension of the uniform blend of resins. SOLUTION: In a solution which has been prepared by heating and dissolving a polyphenylene ether resin in an aromatic hydrocarbon type solvent, a cyanate ester type compound of formula I and a phenolic compound of formula II are reacted in the presence of a metal-containing reaction catalyst (for example, cobalt naphthenate), to thereby produce a solution in which a uniform blend of a modified cyanate ester resin and a polyphenylene ether resin is dissolved. A ketone type solvent is then added to the solution with agitation to produce a suspension of the above uniform blend of resins. In above formulae, R1 is -CH2 - or the like; R2 and R3 are each H or CH3 ; R4 and R5 are each H or a 1-4C alkyl; and n is 1 to 2.

    MAGNETIC RECORDING MEDIUM
    27.
    发明专利

    公开(公告)号:JPH06208716A

    公开(公告)日:1994-07-26

    申请号:JP32318892

    申请日:1992-12-02

    Abstract: PURPOSE:To obtain a magnetic recording medium having excellent abrasion resistance and corrosion resistance by forming a water insoluble resin layer in specified thickness, a water insoluble resin layer in specified thickness containing fillers having fixed particle size on the water insoluble resin layer and a constituting layer comprising a ferromagnetic metallic thin-film layer onto the surface of a nonmagnetic supporter on the side, where a magnetic recording constituting layer is formed. CONSTITUTION:Water insoluble resin layers 6, 7 are shaped onto a nonmagnetic supporter 1, and a magnetic layer 2 and a protective layer 4 are formed onto the layer 7. A back coating layer 3 and a lubricating layer 5 are often formed. The resin layer 6 is formed in thickness of 0.05-1.0mum and the resin layer 7 in thickness of 0.0005-0.05mum, and silica having particle size of 0.01-0.1mum is contained in the resin layer 7 as fillers. The magnetic layer 2 is shaped through a vacuum deposition method, etc., in thickness of 500-10000Angstrom from Fe, Co, a Co-Ni alloy, etc. Accordingly, a magnetic recording medium having high abrasion resistance and strong corrosion resistance is acquired.

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