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    Charged particle beam device
    42.
    发明专利
    Charged particle beam device 有权
    充电颗粒光束装置

    公开(公告)号：JP2014002835A

    公开(公告)日：2014-01-09

    申请号：JP2012135297

    申请日：2012-06-15

    Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

    Inventor： TACHIBANA ICHIRO ,  SUZUKI NAOMASA

    IPC: H01J37/21

    CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

    Abstract: PROBLEM TO BE SOLVED: To resolve a problem that, in the case that signal electrons are detected by energy selection by performing control so as to combine retarding and boosting for the purpose of deep-hole observation and the like, although magnetic variation of an objective lens must be used for focus adjustment, throughput is reduced because of a poor responsibility of magnetic variation.SOLUTION: A charged particle beam device comprises: an electron source generating a primary electron beam; an objective lens converging the primary electron beam; a deflector deflecting the primary electron beam; a detector detecting secondary electrons generated from a sample due to the irradiation of the primary electron beam or reflected electrons; an electrode having a hole through which the primary electron beam passes; a voltage control power supply applying a negative voltage to the electrode; and a retarding voltage control power supply applying a negative voltage to the sample to generate such an electric field that decelerates the primary electron beam on the sample. Focus adjustment is performed while making constant a difference between the voltage applied to the electrode and the voltage applied to the sample.

    Abstract translation: 要解决的问题：为了解决在通过进行控制的能量选择来检测信号电子以便进行深孔观察等的延迟和升压的组合的情况下，尽管目标的磁性变化 必须使用镜头进行焦点调整，因为磁性变化的负担很小，所以吞吐量降低。解决方案：带电粒子束装置包括：产生一次电子束的电子源; 会聚该一次电子束的物镜; 偏转器偏转一次电子束; 检测器，其检测由于一次电子束或反射电子的照射而从样品产生的二次电子; 具有一次电子束通过的孔的电极; 向所述电极施加负电压的电压控制电源; 以及向样品施加负电压的延迟电压控制电源，以产生使样品上的一次电子束减速的电场。 在施加到电极的电压和施加到样品的电压之间恒定地进行聚焦调整。

    Electron microscope equipped with electronic spectrometer
    47.
    发明专利
    Electron microscope equipped with electronic spectrometer 有权
    电子显微镜配有电子光谱仪

    公开(公告)号：JP2009037738A

    公开(公告)日：2009-02-19

    申请号：JP2007198282

    申请日：2007-07-31

    Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

    Inventor： TERADA SHOHEI ,  TANIGUCHI YOSHIFUMI ,  KAJI KAZUTOSHI

    IPC: H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/26 ,  H01J37/05 ,  H01J37/224 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/10 ,  H01J2237/153 ,  H01J2237/24485 ,  H01J2237/2485 ,  H01J2237/30433

    Abstract: PROBLEM TO BE SOLVED: To provide a lens adjusting method and a lens adjusting system for highly efficiently and highly accurately adjusting the optimum conditions of a plurality of multi-pole lenses, when obtaining an energy loss spectrum and a two dimensional element distribution image by using an electron spectrometer.
    SOLUTION: This method is to adjust the multi-pole lenses of the electron spectrometer having a plurality of the multi-pole lenses attached to a transmission electron microscope, and optimum conditions are found by simulation using a parameter design method using the exciting currents of the multi-pole lenses as parameters in this lens adjusting method. In addition, the lens adjusting system for performing the lens adjusting method is provided.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种透镜调整方法和透镜调节系统，用于高效且高精度地调节多个多极透镜的最佳条件时，当获得能量损失谱和二维元素分布 通过使用电子光谱仪的图像。 解决方案：该方法是调整具有多个透镜电子显微镜的多极透镜的电子分光计的多极透镜，并且通过使用参数设计方法进行仿真来发现最佳条件 多极透镜的电流作为该透镜调整方法的参数。 此外，提供了用于执行镜头调节方法的镜片调节系统。 版权所有（C）2009，JPO＆INPIT

    Particle-optical projection device
    48.
    发明专利
    Particle-optical projection device 有权
    粒子投影设备

    公开(公告)号：JP2005268788A

    公开(公告)日：2005-09-29

    申请号：JP2005069236

    申请日：2005-03-11

    Applicant: Ims Nanofabrication Gmbh ,  アイエムエス ナノファブリカツィオン ゲーエムベーハーIMS Nanofabrication GmbH

    Inventor： BUSCHBECK HERBERT ,  CHALUPKA ALFRED ,  LAMMER GERTRAUD ,  NOWAK ROBERT ,  PLATZGUMMER ELMAR ,  STENGL GERHARD DR

    IPC: H01L21/027 ,  G03F7/20 ,  G11B7/09 ,  H01J37/02 ,  H01J37/147 ,  H01J37/15 ,  H01J37/20 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

    Abstract: PROBLEM TO BE SOLVED: To provide a method of arbitrarily changing an image position and a magnification to correct the deviation between the image and target positions, in the direction of the optical axis (Z-direction).
    SOLUTION: In the particle-optical projection device (32), a pattern (B) is depicted on a target tp by energy-property charged particles. This pattern is made to emerge as a patterned beam pb of the charged particles, that emerge from a surface of a material body via at least one crossover c and is focused into an image S having a given magnitude and distortions. In order to correct the deviation in the Z-direction of the image S position from an actual position of the target tp, without changing the magnitude of the image S, the present projection device is provided with a position-detecting means ZD for measuring the Z positions of the target tp at several points and a control means 33 for calculating a correction value cr of a selected lens parameter of the particle-optical lens L2, arranged at the last stage and controlling the lens parameter, in accordance with the connection value.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种任意改变图像位置和倍率以在光轴方向（Z方向）上校正图像与目标位置之间的偏差的方法。 解决方案：在粒子光学投影装置（32）中，通过能量带电粒子在目标tp上示出了图案（B）。 该图案被形成为带电粒子的图案化束pb，其经由至少一个交叉c从材料体的表面出射，并被聚焦成具有给定幅度和失真的图像S. 为了校正图像S位置的Z方向与目标tp的实际位置的偏差，而不改变图像S的大小，本投影装置设置有位置检测装置ZD，用于测量 在多个点处的目标tp的Z位置和用于根据连接值计算布置在最后阶段并控制透镜参数的粒子光学透镜L2的选定透镜参数的校正值cr的控制装置33 。 版权所有（C）2005，JPO＆NCIPI

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