Dental implant and surface treatment method of dental implant
    77.
    发明专利
    Dental implant and surface treatment method of dental implant 审中-公开
    牙科植入物的牙科植入物和表面处理方法

    公开(公告)号:JP2012143416A

    公开(公告)日:2012-08-02

    申请号:JP2011004444

    申请日:2011-01-13

    IPC分类号: A61C8/00 A61L27/00

    摘要: PROBLEM TO BE SOLVED: To provide an implant that has macro pores having an inner diameter with the level of several tens of μm and micro pores having an inner diameter of 1-2 μm while having pores with the nanometer level in the surface.SOLUTION: The implant has the surface that has the macro pores having the inner diameter with the level of several tens of μm and micro pores having the inner diameter of 1-2 μm and comprises nano discharge craters having an inner diameter with the level of several tens of nm. The surface treatment method includes steps of producing the macro pores having the inner diameter with the level of several tens of μm by acid treatment of the surface; producing the micro pores having the inner diameter of 1-2 μm by blast treatment of the implant surface; and producing the nano discharge craters having an inner diameter with the level of several tens of nm by anodic oxidation treatment of the implant surface.

    摘要翻译: 要解决的问题:提供具有内径为几十μm的微孔和内径为1-2μm的微孔的植入物,同时具有表面纳米级的孔 。 解决方案:植入物具有具有内径为几十μm的宏观孔的表面和内径为1-2μm的微孔,并且包括具有内径的纳米放电坑 水平几十nm。 表面处理方法包括通过对表面进行酸处理来制造具有数十μm的内径的大孔的步骤; 通过种植体表面的喷砂处理产生内径为1-2μm的微孔; 通过对植入物表面进行阳极氧化处理,制造具有数十nm的内径的纳米放电坑。 版权所有(C)2012,JPO&INPIT