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公开(公告)号：JP4261743B2
公开(公告)日：2009-04-30
申请号：JP2000201443
申请日：2000-06-29
Applicant: 株式会社日立製作所
Abstract: PROBLEM TO BE SOLVED: To provide a sample image focused over the whole or a certain two-dimensional region for providing the two-dimensional image, without blurring all over the image by composing the two-dimensional image of the sample as viewed from the direction of a discharge particle beam source, based on a signal of a part where the charged particle beam is focused among signals outputted from a charged particle beam detector. SOLUTION: Each signal outputted from a charged particle detector is stored for different focus to calculate an arbitrary characteristic amount indicating degree of coincidence of focus from the stored signals, and the characteristic amount is compared between the same coordinates of signal of different focus to form a two-dimensional image. In a semiconductor sample comprising a contact hole, a copy of two-dimensional image which is focused over the entire sample can be made, by picking up both the image focused on a surface of the semiconductor sample and the image focused on a bottom surface of the contact hole, and extracting a coincident part of focus from each image to make a single composite image.
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公开(公告)号：JP4006946B2
公开(公告)日：2007-11-14
申请号：JP2001016492
申请日：2001-01-25
Applicant: 株式会社日立製作所
IPC: G01N23/225 , H01J37/147 , H01J37/244 , H01J37/28 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To prevent deterioration of a resolving power generated by off-axis aberration increased as the scanning center of a primary electron beam runs off from the center axis. SOLUTION: The lower stage image shift deflector of an upper and a lower image shift deflectors is composed of a multipolar electrostatic deflection electrode, and is arranged inside an effective objective lens. Thereby, the resolving power and dimension measurement precision are high in the case that a moving amount by an image shift is large. Therefore, in a process of a large area wafer and an ultrafine semiconductor element, high-precision and high-throughput inspection can be achieved.
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公开(公告)号：JP3767443B2
公开(公告)日：2006-04-19
申请号：JP2001298979
申请日：2001-09-28
Applicant: 株式会社日立製作所
IPC: G01N23/225 , H01J37/09 , G21K5/04 , H01J37/244 , H01J37/252
Abstract: PROBLEM TO BE SOLVED: To improve reliability in the X-ray analysis of a thinned sample by reducing beam tail and to facilitate positioning of the beam current measuring means (Faraday cup) used in the X-ray analysis. SOLUTION: A new diaphragm is provided at the bottom of the objective lens. And a tubular member constructed of a light element material as represented by carbon and beryllium is provided between the objective lens and a newly-provided diaphragm. And the newly-provided diaphragm and the Faraday cup are made in one-body structure and a means of controlling the position against the optical axis is provided.
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Patent Agency Ranking
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公开(公告)号：JP5218683B2
公开(公告)日：2013-06-26
申请号：JP2012047510
申请日：2012-03-05
Applicant: 株式会社日立製作所
IPC: H01J37/04 , H01J37/147 , H01J37/153 , H01J37/21 , H01J37/22
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公开(公告)号：JP4613405B2
公开(公告)日：2011-01-19
申请号：JP2000274993
申请日：2000-09-06
Applicant: 株式会社日立製作所
IPC: G01N23/225 , H01J37/244 , H01J37/141 , H01J37/28
Abstract: PROBLEM TO BE SOLVED: To provide a TTL-mode scanning electron microscope capable of giving high resolution to a secondary electron image and effectively providing a reflected electron image with good contrast. SOLUTION: In order not to impair the yield of reflected electrons, the angle of rotation of the reflected electrons by a magnetic field of an objective lens is considered in terms of the energy of reflected electrons, thereby disposing a detector in such a position that the reflected electrons can be captured in as wide an energy range as possible.
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公开(公告)号：JP4263416B2
公开(公告)日：2009-05-13
申请号：JP2002062817
申请日：2002-03-08
Applicant: 株式会社日立製作所
CPC classification number: H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823
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