Abstract:
PROBLEM TO BE SOLVED: To provide a magnesium oxide film capable of making discharge starting voltage of an electrode low in case of use as an electrode protection film, and of reduced manufacturing cost. SOLUTION: The magnesium oxide film 1 is provided with a magnesium oxide thin film part 4 and a whisker 5 growing from the surface of and integrated with the magnesium oxide thin film part 4. The magnesium oxide film 1 is made by forming the magnesium oxide thin film part 4 on the surface of a base material 2 by the chemical gas phase deposition method (the CVD method) under an open atmosphere, and growing the whisker 5 from the surface and being formed in a body with the magnesium oxide thin film part 4. A plasma generation electrode using the magnesium oxide film 1 as an electrode protection film has a discharge starting voltage lowered by 30% or more as compared with a conventional one. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a film deposition method of a magnesium oxide film capable of easily depositing a uniform magnesium oxide film. SOLUTION: A magnesium oxide film is deposited on a surface of a base material A by generating discharge plasma under the pressure near the atmospheric pressure by using a specified mixed gas containing the components (A) to (C): (A) an organic magnesium compound; (B) at least one of oxygen and steam; (C) at least one to be selected from a group consisting of helium, neon, argon, krypton, xenon and nitrogen, and by using the chemical vapor deposition method using the discharge plasma. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a magnesium oxide film capable of making discharge starting voltage of an electrode low in case of use as an electrode protection film, and of reduced manufacturing cost. SOLUTION: The magnesium oxide film 1 is provided with an aggregate 6 of a magnesium oxide thin film part 4 and magnesium oxide plate crystal 5 growing from the surface of and integrated with the magnesium oxide thin film part 4. The magnesium oxide film 1 is formed by growing magnesium oxide plate crystal 5 on the surface of the magnesium oxide thin film part 4 by the chemical gas phase deposition method (the CVD method) under an open atmosphere, on the surface of a base layer 3 formed by coating magnesium compound solution generating magnesium oxide by thermal decomposition on a surface of a base material 2 and heat-treating it. A plasma generation electrode using the magnesium oxide film 1 as an electrode protection film has a discharge starting voltage lowered by 30% or more as compared with a conventional one. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To easily and efficiently form a magnesium oxide film with excellent transparency without using an expensive device.SOLUTION: A raw material aqueous solution is prepared wherein 10g of magnesium acetate tetrahydrate is dissolved in 190g of water, and 2g of ethylene glycol is added. The raw material aqueous solution is put in an atomization container 21 of a raw material atomization device 2, and a temperature of a substrate 8 set on a bottom part of a reaction space 61 is increased to 400°C by a heater 7. By operating an ultrasonic vibrator 22, the raw material aqueous solution is atomized, and raw material gas with mist of the raw material aqueous solution carried in air is supplied to the reaction space 61. When the raw material gas flows along a surface of the substrate 8, the magnesium oxide film is formed on the surface of the substrate 8. It is confirmed that transmissivity of the formed film is not degraded even when a thickness increases. In addition, it is confirmed that the same result is obtained even when diethylene glycol is used in stead of the ethylene glycol.