公开(公告)号：JP4296995B2

公开(公告)日：2009-07-15

申请号：JP2004174373

申请日：2004-06-11

Applicant: Jsr株式会社

Inventor： 賢植 呉 ,  博幸 安田 ,  真司 白木

IPC: C07F15/00 ,  H01L51/50 ,  C07D213/30 ,  C07D221/20 ,  C09K11/06 ,  H05B33/14

公开(公告)号：JP4333473B2

公开(公告)日：2009-09-16

申请号：JP2004143606

申请日：2004-05-13

Applicant: Jsr株式会社

Inventor： 賢植 呉 ,  博幸 安田 ,  真司 白木

IPC: C07F15/00 ,  C09K11/06

公开(公告)号：JP4951827B2

公开(公告)日：2012-06-13

申请号：JP2001248430

申请日：2001-08-17

Applicant: Jsr株式会社

Inventor： 努 下川 ,  健一 横山 ,  敏 江幡 ,  勇 王 ,  真司 白木

IPC: G03F7/004 ,  C07C381/00 ,  C07D309/12 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a compound having a sulfonyl structure, giving excellent resist pattern and useful as an acid generating agent sensitive to active radiation such as far ultraviolet radiation, a radiation-sensitive acid generating agent produced by using the compound and a positive-type or negative-type chemical- amplification radiation-sensitive resin composition. SOLUTION: The compound having a sulfonyl structure is expressed by general formula I [R to R are each H, a 1-20C substituted/unsubstituted alkyl or alkenyl or a substituted/unsubstituted aryl or heteroaryl; and Y is O, S, =N-R , =N-OR , =N-N-R or the like (R and R are each same as R to R )]. Concrete example of the compound of general formula I is 2- methoxyimino-2-indanonoxime-1-propanesulfonate.

公开(公告)号：JP4283582B2

公开(公告)日：2009-06-24

申请号：JP2003105353

申请日：2003-04-09

Applicant: Jsr株式会社 ,  シャープ株式会社

Inventor： 一明 丹羽 ,  寛文 佐々木 ,  和樹 小林 ,  真司 白木 ,  郁夫 迫野

IPC: G03F7/023 ,  G03F7/038 ,  G03F7/075 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition with which patterned insulative films varying in water repellency are easily formed with high accuracy, a method for forming the patterned insulative films using the composition, a display element using the composition, a flat panel display device, and a method for manufacturing the same. SOLUTION: The resin composition contains (A) an alkaline soluble polymer component, (B) a 1, 2-quinonediazido compound, and (C) a water repellent siloxane resin at specific ratios. The coating film using the resin composition is subjected to pattern exposure and development in the method for forming the patterned insulative films. The display element and the flat panel display device are provided with interlayer insulating films formed by the resin composition. The method for manufacturing the flat panel display device includes an interlayer insulating film forming step of subjecting the regions formed with conductor layers to the pattern exposure with the exposure energy by which only the surface layer portions are cured in part of these regions and the whole in the thickness direction is cured in another part and a conductor layer forming step of forming the conductor layers by liquid material on the surfaces of the interlayer insulating films. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP4539183B2

公开(公告)日：2010-09-08

申请号：JP2004174372

申请日：2004-06-11

Applicant: Jsr株式会社

Inventor： 賢植 呉 ,  博幸 安田 ,  真司 白木

IPC: C07D401/12

公开(公告)号：JP4655840B2

公开(公告)日：2011-03-23

申请号：JP2005262997

申请日：2005-09-09

Applicant: Jsr株式会社

Inventor： 徹 梶田 ,  真司 白木 ,  真義 石川 ,  政暁 花村

IPC: G03F7/033 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

公开(公告)号：JP3752687B2

公开(公告)日：2006-03-08

申请号：JP2002317124

申请日：2002-10-31

Applicant: Jsr株式会社

Inventor： 一明 丹羽 ,  寛文 佐々木 ,  真司 白木 ,  正睦 鈴木

IPC: H05B33/22 ,  H01L51/50 ,  H05B33/14