Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same
    1.
    发明专利
    Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same 有权
    遮蔽装置,其制造方法以及使用其制造有机发光显示装置的方法

    公开(公告)号:JP2008163448A

    公开(公告)日:2008-07-17

    申请号:JP2007272994

    申请日:2007-10-19

    CPC classification number: C23C14/042 H01L51/56

    Abstract: PROBLEM TO BE SOLVED: To provide a mask with which a large-sized division mask can be fabricated by forming an aperture region parallel to a roll direction and a stripe longitudinal direction and the reliability of the mask can be improved, and a method of fabricating the mask, and an organic light emitting display device using the same.
    SOLUTION: The mask device includes: one or a plurality of mask alignment mark formed on a mask; a blocking region formed on the mask and blocking a deposition material; and an aperture region formed on the mask and through which the deposition material passes, wherein the one or the plurality of the mask alignment mark is formed outside the aperture region, the aperture region has a stripe pattern, and the roll direction of the mask substrate is parallel to the longitudinal direction of the stripe pattern.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种可以通过形成与辊方向平行的开口区域和条形纵向方向来制造大尺寸分割掩模的掩模,并且可以提高掩模的可靠性,并且 制造掩模的方法和使用该掩模的有机发光显示装置。 解决方案:掩模装置包括:形成在掩模上的一个或多个掩模对准标记; 形成在掩模上并阻挡沉积材料的阻挡区域; 以及形成在掩模上并且沉积材料通过的孔径区域,其中一个或多个掩模对准标记形成在孔区域外部,开口区域具有条纹图案,并且掩模基板的辊方向 平行于条纹图案的纵向方向。 版权所有(C)2008,JPO&INPIT

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