摘要:
An abrasive article (2) includes a plurality of abrasive particles (6) securely affixed to a substrate (4) with a corrosion resistant matrix material (8). The matrix material (8) includes a sintered corrosion resistant powder and brazing alloy. The brazing alloy includes an element which reacts with and forms a chemical bond with the abrasive particles (6), thereby securely holding the abrasive particles (6) in place. A method of forming the abrasive article (2) includes arranging the abrasive particles (6) and matrix material (8), and applying sufficient heat and pressure to the mixture of abrasive particles (6) and matrix material (8) to cause the corrosion resistant powder to sinter, the brazing alloy to flow around, react with, and form chemical bonds with the abrasive particles (6), and allow the brazing alloy to flow through the interstices of the sintered corrosion resistant powder and form an inter-metallic compound therewith.
摘要:
PROBLEM TO BE SOLVED: To provide a manufacturing method of an abrasive compact using a mixture of abrasive particles having different diameters and having a longer effective working life compared to compacts of the conventional technology, used for machining, milling, polishing, digging, and other polishing and machining work. SOLUTION: The abrasive compact is manufactured by molding ultrahard abrasive particles such as diamond at high temperatures and high pressure with a binder. The abrasive particles have an average diameter of less than 20 microns and at least three different average grain diameters. COPYRIGHT: (C)2004,JPO
摘要:
PROBLEM TO BE SOLVED: To provide methods for making tools for conditioning polishing pads that reduce or minimize the corrosive effects and for using the same.SOLUTION: A method for manufacturing an abrasive tool for conditioning a CMP pad, the method comprising: coating a CMP conditioner that includes abrasive grains coupled to a substrate via a metal bond, by a process comprising: a) positioning the CMP conditioner in a vacuum deposition chamber; b) and depositing a composition containing carbon, silicon, oxygen, hydrogen, and fluorine onto it by co-deposition of cluster-less particle beams that include ions, atoms, or radicals of the carbon, silicon, oxygen, hydrogen, and fluorine, wherein the mean free path of each particle species is in excess of the distance between its source and a growing particle coating surface of the conditioner.