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    함불소 화합물, 함불소 폴리머 및 그 제조 방법
    42.
    发明公开
    함불소 화합물, 함불소 폴리머 및 그 제조 방법 无效
    氟化合物，氟聚合物及其生产方法

    公开(公告)号：KR1020050058383A

    公开(公告)日：2005-06-16

    申请号：KR1020057002852

    申请日：2003-08-21

    申请人： 아사히 가라스 가부시키가이샤

    发明人： 고다마순이치 ,  가네코이사무 ,  요코코지오사무 ,  오카다신지 ,  다케베요코 ,  가와구치야스히데

    IPC分类号： C08F36/16

    CPC分类号： C08F36/20 ,  C08F36/16 ,  C08F214/18 ,  C08F2/60

    摘要： The invention provides fluoropolymers which bear functional groups in high contents and can therefore fully exhibit the characteristics of the functional groups and which do not bring about a drop in Tg, namely, fluoropolymers comprising monomer units formed by cyclopolymerization of a fluorinated diene having a functional group as represented by the general formula (1): CFR1=CR2-Q-CR3=CHR 4 (1) wherein R1 to R4 are each independently hydrogen, fluoro, alkyl having at most eight carbon atoms, or alicyclic hydrocarbyl, with the provisos that at least one of R1 to R 4 is alicyclic hydrocarbyl and that the alkyl or the alicyclic hydrocarbyl may be substituted with fluoro, alkyl, or fluoroalkyl; and Q is a divalent organic group having a blocked acid group capable of being developed with acid into an acid group or an organic group convertible into the blocked acid group.

    摘要翻译： 本发明提供含有高含量官能团的含氟聚合物，因此可以充分发挥官能团的特性，并且不会导致Tg降低，即包含通过具有官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物 如通式（1）所示：CFR1 = CR2-Q-CR3 = CHR4（1）其中R1至R4各自独立地为氢，氟，具有至多8个碳原子的烷基或脂环族烃基，条件是 R 1至R 4中的至少一个为脂环烃基，并且烷基或脂环烃基可以被氟，烷基或氟烷基取代; Q是具有能够酸形成的酸性基团的封端酸基的二价有机基团或可转化为封端的酸基的有机基团。

    플루오르가 함유된 폴리머 및 이를 포함하는 화학증폭형레지스트 조성물
    47.
    发明授权
    플루오르가 함유된 폴리머 및 이를 포함하는 화학증폭형레지스트 조성물 有权
    플루오르가함유된폴리머및이를포함하하는화학증폭형레지스트조성물

    公开(公告)号：KR100416595B1

    公开(公告)日：2004-02-05

    申请号：KR1020010023752

    申请日：2001-05-02

    申请人： 삼성전자주식회사

    发明人： 김현우

    IPC分类号： G03F7/004

    CPC分类号： C08F232/08 ,  C08F214/18 ,  C08F224/00 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108

    摘要： A photosensitive polymer is provided which includes: (a) perfluoro-2,2-dimethy-1,3-dioxol derivatives having the following repeating unit:and (b) vinyl derivatives having the following repeating unit:wherein R1 is H, Cl, or F; each of R2 and R3 is H or F; R4 is H, F, CF3, OCF3, OCF2CF3, OCF2CF2CF3, CH2C(CF3)2OH, fluorinated alkyloxy group having an acid-labile group, n-perfluoroalkyl group having 1 to 8 carbon atoms, ORF, wherein RF is n-perfluoroalkyl group having 1 to 3 carbon atoms, or OQZ, wherein Q is perfluorinated alkylene group having 0 to 5 oxygen atoms, the sum of carbon atom and oxygen atom in the Q is 2 to 10, and Z is COOR, SO2F, CN, COF, or OCH3, wherein R is alkyl group having 1 to 4 carbon. A photoresist composition includes the photosensitive polymer and a photoacid generator(PAG).

    摘要翻译： 提供一种光敏聚合物，它包括：（a）具有以下重复单元的全氟-2,2-二甲基-1,3-二氧杂环戊烯衍生物：和（b）具有下述重复单元的乙烯基衍生物：其中R1是H，Cl， 或F; 每个R2和R3是H或F; R4是H，F，CF3，OCF3，OCF2CF3，OCF2CF2CF3，CH2C（CF3）2OH，具有酸不稳定基团的氟化烷氧基，具有1-8个碳原子的正全氟烷基，ORF，其中RF是n-全氟烷基 其中Q是具有0至5个氧原子的全氟化亚烷基，Q中碳原子和氧原子之和为2至10，并且Z为COOR，SO 2 F，CN，COF， 或OCH 3，其中R是具有1至4个碳的烷基。 光致抗蚀剂组合物包含光敏聚合物和光酸产生剂（PAG）。