公开(公告)号：KR1020110064361A

公开(公告)日：2011-06-15

申请号：KR1020090120917

申请日：2009-12-08

申请人： 삼성전자주식회사

发明人： 성정현

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/2051 ,  G03F7/2057 ,  G03F7/70383 ,  G03F7/70516

摘要： PURPOSE: A maskless exposure apparatus and pattern compensating method using the same are provided to reduce the number of requirement conditions for stage yawing control performance by controlling a synchronization signal for switching the frame of a DMD, thereby reducing the price of a large stage. CONSTITUTION: DMD(Digital Micro-mirror Device)s selectively irradiate light onto a substrate according to pattern information. A stage moves the substrate in a scan direction. A location measuring unit(40) measures the location of the stage by movement of the substrate. The location measuring unit includes a plurality of laser interference systems(41,42) to measure the left and right sides of the stage. A synchronization signal generating unit(50) generates a synchronization signal(PEG) for adjusting the driving timing of the DMDs.

摘要翻译： 目的：通过控制用于切换DMD的帧的同步信号来减少舞台横摆控制性能的要求条件的数量，从而降低了大阶段的价格，提供了无掩模曝光装置和图案补偿方法。 构成：DMD（数字微镜装置）根据图案信息选择性地将光照射到基板上。 台阶沿扫描方向移动基板。 位置测量单元（40）通过衬底的移动来测量平台的位置。 位置测量单元包括测量台的左侧和右侧的多个激光干涉系统（41,42）。 同步信号生成单元（50）生成用于调整DMD的驱动定时的同步信号（PEG）。

公开(公告)号：KR1020110024007A

公开(公告)日：2011-03-09

申请号：KR1020090081843

申请日：2009-09-01

申请人： 한국과학기술원

发明人： 신하용 ,  신용철 ,  이일랑 ,  박세연 ,  정병덕

IPC分类号： H01L21/027

CPC分类号： G03F7/704 ,  G03F7/2051 ,  G03F7/70383 ,  G03F7/70625

摘要： PURPOSE: A maskless exposure method using rasterization of massive polygons is provided to efficiently transmit data by transmitting only the information with an event to change the operation state of point light. CONSTITUTION: A substrate is exposed by using a lot of point light(12). A repeated pattern instance is extracted from an inputted pattern. Slabs are generated by dividing a polygon(20) of the pattern instance in parallel to a scan direction. Scan pieces that are sections for turning on the point light are calculated from the slabs every scan line(13) through which the point light passes in the pattern instance. Scan data with the position information of the scan pieces is generated.

摘要翻译： 目的：提供使用大面积多边形光栅化的无掩模曝光方法，通过仅发送信息来传输数据，改变点光源的运行状态。 构成：通过使用大量点光（12）暴露基板。 从输入的图案中提取重复图案实例。 通过将图案实例的多边形（20）与扫描方向平行地分割来生成平板。 作为点光源的部分的扫描片是从点阵光在图案实例中通过的每个扫描线（13）的平板计算的。 生成扫描件的位置信息的扫描数据。

公开(公告)号：KR1020110020869A

公开(公告)日：2011-03-03

申请号：KR1020107029578

申请日：2009-05-29

申请人： 코닝 인코포레이티드

发明人： 콥,조슈아,엠 ,  미찰로스키,폴,에프

IPC分类号： G03F7/20 ,  G02B26/00

CPC分类号： G03F7/70291 ,  G03F7/70091 ,  G03F7/70275 ,  G03F7/20 ,  G03F7/2051

摘要： 마스크리스 리소그래픽 투사 시스템과 같은 집광된 스팟의 패턴을 생성하기 위한 광학 시스템은 조명, 패턴 생성기 및 이미저를 포함한다. 조명은 광빔을 생성하기 위한 광원, 광빔 내에서 광을 균등하게 분산시키기 위한 호모지나이저 및 광원을 호모나이저에 결합하기 위한 콘덴서를 포함한다. 패턴 생성기는 조명으로부터 광빔으로 개별적으로 조광된 어드레스가능 소자를 갖는다. 이미저는 이미저와 조명 내에서 개구조리개에 결합된 집광된 스팟을 형성하기 위한 대응 포커싱 소자에 패턴생성기의 어드레스가능 소자를 이미지한다. 조명은 집광된 스팟의 크기를 줄이기 위해 이미저 개구조리개를 언더필한다. 콘덴서는 집광된 스팟의 크기와 형상을 더욱 제어하기 위해 조명 개구조리개를 언더필한다.

公开(公告)号：KR1020100083459A

公开(公告)日：2010-07-22

申请号：KR1020090002840

申请日：2009-01-14

申请人： 삼성전자주식회사

发明人： 김을태 ,  이희국 ,  장상돈 ,  박상현 ,  배상우 ,  백동석

IPC分类号： H01L21/027

CPC分类号： G03F7/2051 ,  G03F7/7005 ,  G03F7/70383 ,  G03F7/70516 ,  G03F7/70716

摘要： PURPOSE: An exposing device and a method for measuring orthogonality thereof are provided to measure and correct the orthogonality of a stage by using an optical unit installed on the exposing device without an additional measuring device. CONSTITUTION: A stage(18) transfers a substrate. An optical unit(66) generates a plurality of beams irradiated to a substrate. A controller(63) exposes a plurality of beams on the exposed part of the substrate while moving the stage. The orthogonality of the stage is measured by using the exposed result. A beam distance measuring unit(26) measures the distance between a plurality of exposed beams.

摘要翻译： 目的：提供一种曝光装置及其正交性的测量方法，通过使用安装在曝光装置上的光学单元，无需额外的测量装置来测量和校正舞台的正交性。 构成：阶段（18）转移底物。 光学单元（66）产生照射到基板的多个光束。 控制器（63）在移动平台的同时在基板的暴露部分上露出多个光束。 通过使用暴露结果来测量舞台的正交性。 光束距离测量单元（26）测量多个外露光束之间的距离。

公开(公告)号：KR1020100003604A

公开(公告)日：2010-01-11

申请号：KR1020080063582

申请日：2008-07-01

申请人： 에스케이하이닉스 주식회사

发明人： 우성하

IPC分类号： H01L21/027

CPC分类号： H01J37/3174 ,  G03F7/2051 ,  G03F7/70383

摘要： PURPOSE: An electron beam exposure device is provided to selectively control a beam according to a pattern by controlling the shape of the beam variously. CONSTITUTION: A mask exposing a pattern is aligned and mounted on a loading unit. A source unit(A) generates and outputs an electron beam to irradiate the beam on a mask with a preset angle. A column unit(B) includes a plurality of optical lenses and control the path of the outputted electron beam. A first iris diaphragm(410), a second iris diaphragm(420) with a square aperture, a third iris diaphragm(430), and a fourth iris diaphragm(440) with a lozenge shape are included in the column unit. The column unit includes a first lens unit(210), a second lens unit(220), and a third lens unit(230).

摘要翻译： 目的：提供电子束曝光装置，通过不同地控制光束的形状，根据图案选择性地控制光束。 构成：露出图案的面罩对齐并安装在装载单元上。 源单元（A）产生并输出电子束以将预定角度的光束照射在掩模上。 列单元（B）包括多个光学透镜并且控制输出的电子束的路径。 柱单元中包括第一可变光阑（410），具有方形孔的第二光阑（420），第三光阑（430）和具有菱形形状的第四可见光阑（440）。 列单元包括第一透镜单元（210），第二透镜单元（220）和第三透镜单元（230）。

公开(公告)号：KR1020090091454A

公开(公告)日：2009-08-28

申请号：KR1020080016722

申请日：2008-02-25

申请人： 엘지전자 주식회사

发明人： 신영훈 ,  김명관

IPC分类号： H01L21/027

CPC分类号： G03F7/2051 ,  G03F7/70383

摘要： A maskless exposure apparatus using a plurality of spatial light modulator and a method for forming a pattern using the same are provided to rapidly project the pattern by successively projecting the patterns on a plurality of spatial light modulators. A location information provider(250) outputs the input signal which has the predetermined cycle according to the movement of the substrate settled in the stage A drive pulse generating unit(260) produces a plurality of drive pulse signals having the different phase difference in the predetermined cycle using the input signal. At least two spatial light modulators(231,232) successively deliver the light which is income from the light source to the substrate. The location information provider outputs the input signal which shows the location of substrate as the substrate(241) settled in the stage(240) moves. A plurality of drive pulse signals in which the phase difference is generated in one cycle is produced using the input signal.

摘要翻译： 提供使用多个空间光调制器的无掩模曝光装置和使用其的形成图案的方法，通过在多个空间光调制器上连续投影图案来快速投影图案。 位置信息提供器（250）根据沉积在载物台A中的基板的移动来输出具有预定周期的输入信号。驱动脉冲发生单元（260）产生具有预定的不同相位差的多个驱动脉冲信号 循环使用输入信号。 至少两个空间光调制器（231,232）将从光源收入的光连续地传送到基板。 位置信息提供者输出当底座（240）移动时沉积的基底（241）的基底位置的输入信号。 使用输入信号产生在一个周期内产生相位差的多个驱动脉冲信号。

公开(公告)号：KR1020090003256A

公开(公告)日：2009-01-09

申请号：KR1020087023227

申请日：2007-03-16

申请人： 후지필름 가부시키가이샤

发明人： 킨조나오토 ,  스미카츠토 ,  키타노료

IPC分类号： H01L21/027

CPC分类号： G03F7/70791 ,  G01D1/00 ,  G01D15/00 ,  G01D21/00 ,  H04N1/0473 ,  H04N1/1008 ,  H04N1/113 ,  H04N1/19505 ,  H04N1/19573 ,  H04N2201/04713 ,  H04N2201/0472 ,  H04N2201/04744 ,  H04N2201/04763 ,  G03F7/70391 ,  G03F7/2051

摘要： It is possible to set an optical magnification F capable of making a recording position shift amount LER (F) with respect to Y direction of the plotting point formed by a micro mirror (40) within an allowance range from the relationship between a Y-direction distance (TY0) between mirror images obtained by projecting micro mirrors (40) constituting a DMD (36) onto a substrate (F), an inclination angle R of the DMD (36), an image pattern recording pitch Y, and an optical magnification F.

摘要翻译： 可以设定光学倍率F，该光学倍率F能够将由微反射镜（40）形成的绘制点的Y方向的记录位置偏移量LER（F）从Y方向 通过将构成DMD（36）的微反射镜（40）投影到基板（F）上获得的镜像之间的距离（TY0），DMD（36）的倾斜角度R，图像图案记录间距Y和光学倍率 F。

公开(公告)号：KR100863071B1

公开(公告)日：2008-10-10

申请号：KR1020070042350

申请日：2007-05-01

申请人： (주)하드램

发明人： 민성욱 ,  김창현

IPC分类号： G03F7/20

CPC分类号： G03F7/2004 ,  G03F7/2008 ,  G03F7/2051 ,  G03F7/2057 ,  G03F7/7035 ,  G03F7/70558

摘要： A multi-exposure system using 405 nanometer laser diodes is provided to enable marking of specific patterns with different content simultaneously at each coordinate over a broad range of a work piece, thereby improving the work efficiency and convenience. A multi-exposure system using 405 nanometer laser diodes comprises: a plurality of light sources(110) generating light by using 405 nm laser diodes; a plurality of scanners(30) modifying the light generated from the light sources to reflect the light along a predetermined path; a projection unit(40) for scanning the light reflected by the scanners to a stage section; and a control section for adjusting the light sources, scanners and stage section and controlling the traces of the light to form a desired pattern according to electrical signals transmitted from a pattern information section(70). The multi-exposure system further comprises a beam shaper(200) and a beam expander(300) on the path of the light sources and the scanners.

摘要翻译： 提供了一种使用405纳米激光二极管的多曝光系统，可以在宽范围的工件上的每个坐标上同时对具有不同内容的特定图案进行标记，从而提高工作效率和便利性。 使用405纳米激光二极管的多曝光系统包括：通过使用405nm激光二极管产生光的多个光源（110）; 多个扫描器（30），修改从光源产生的光以沿着预定路径反射光; 投影单元，用于将由扫描仪反射的光扫描到舞台部分; 以及控制部分，用于根据从图案信息部分（70）发送的电信号来调节光源，扫描仪和舞台部分，并控制光迹以形成期望的图案。 多曝光系统还包括在光源和扫描仪的路径上的光束整形器（200）和光束扩展器（300）。

公开(公告)号：KR1020080086485A

公开(公告)日：2008-09-25

申请号：KR1020087016362

申请日：2006-12-20

申请人： 마이크로닉 아베

发明人： 락,토마스

IPC分类号： H01L21/027

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/2051 ,  G03F7/2059 ,  G03F7/70383

摘要： The present invention relates to an apparatus (100) for patterning a workpiece arranged at an image plane (150) and sensitive to electromagnetic radiation, comprising a source (142) emitting electromagnetic radiation onto an object plane (160) and at least two spatial light modulators each comprising numerous of object pixels, adapted to receive the electromagnetic radiation at the object plane and to relay the electromagnetic radiation toward the workpiece, wherein the electromagnetic radiation is split into at least two beams, which beams will impinge on different spatial light modulators, by a beam splitting device arranged at an optical plane between the spatial light modulators and an illuminator pupil or a conjugate optical plane. The invention also relates to a method for patterning a workpiece with a plurality of spatial light modulators.

摘要翻译： 本发明涉及一种用于将布置在图像平面（150）上并对电磁辐射敏感的工件图案化的设备（100），其包括将电磁辐射发射到物平面（160）上的源（142）和至少两个空间光 每个调制器包括许多对象像素，适于在物平面处接收电磁辐射并将电磁辐射中继到工件，其中电磁辐射被分成至少两个光束，该光束将撞击在不同的空间光调制器上， 通过布置在空间光调制器与照明器光瞳或共轭光学平面之间的光学平面处的分束装置。 本发明还涉及一种用多个空间光调制器对工件图案化的方法。

公开(公告)号：KR1020080067915A

公开(公告)日：2008-07-22

申请号：KR1020070005412

申请日：2007-01-17

申请人： 엘지전자 주식회사

发明人： 김명관 ,  이형진 ,  홍윤종 ,  이창주 ,  김호철 ,  안종식

IPC分类号： G03F7/20

CPC分类号： G03F7/2051 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358 ,  G03F7/70383 ,  G03F7/70791

摘要： A maskless exposure device, and a method for aligning the maskless exposure device are provided to allow exposure process to be carried out with a mask, thereby reducing the cost for exposure process. A maskless exposure device comprises a lightening part(100); a digital micromirror device(DMD, 110) provided with a plurality of micromirrors which receive the external signal and selectively reflect the light of the lightening part; and a projection lens(120) which controls the resolution of the light reflected at the DMD so as to penetrate an exposing membrane, wherein the light is irradiated to at least one micromirror of the plurality of micromirrors of the DMB, the light reflected at the central micromirror is photographed, and the position of the DMD is aligned with the photographed image.

摘要翻译： 提供无掩模曝光装置和对准无掩模曝光装置的方法，以允许用掩模进行曝光处理，从而降低曝光处理的成本。 无掩模曝光装置包括发光部（100）; 数字微镜装置（DMD，110），其具有接收所述外部信号并选择性地反射所述发光部的光的多个微镜; 以及投影透镜（120），其控制在DMD处反射的光的分辨率以穿透曝光膜，其中所述光被照射到所述DMB的所述多个微镜中的至少一个微反射镜， 拍摄中央微镜，DMD的位置与拍摄图像对齐。