公开(公告)号：KR1020130028180A

公开(公告)日：2013-03-19

申请号：KR1020110079967

申请日：2011-08-11

申请人： 주식회사 옵토원

发明人： 곽경호 ,  오승훈 ,  양병철

IPC分类号： G03F1/38 ,  G03F1/00 ,  B29C33/38 ,  G03F7/20

CPC分类号： G03F1/38 ,  G03F1/48 ,  G03F7/0002 ,  G03F7/16 ,  G03F7/2014 ,  G03F7/2053 ,  G03F7/26

摘要： PURPOSE: A manufacturing method of a soft mask and roll mold and an exposure apparatus using the same are provided to form patterns on the surface of a roll mold, thereby obtaining a roll mold with a low price, which is used in a roll-to-roll imprinting process. CONSTITUTION: A manufacturing method of a soft mask comprises: a step of transcribe a stamp pattern on a resin layer; a step of removing the remaining layer of a resin layer(S12); a step of evaporating a metal on a substrate by the pattern and removing the resin layer(S13); a step of transcribing the metal pattern on one side of the resin layer by applying pressure to one side of the substrate; and a step of applying a pressure to the lower film with the same material as the resin film. [Reference numerals] (AA) Soft mask; (BB) Metal roll; (S11) Substrate imprint; (S12) Substrate etching; (S13) Metal deposition/resin layer removal; (S14) Film reverse-imprint; (S15) Lower film adhesion; (S16) Molding; (S21) Roll-mask adhesion; (S22) Roll exposure; (S23) Roll step-rotation; (S31) Non-exposed photosensitizer removal; (S32) Metal deposition; (S33) Photosensitizer removal

摘要翻译： 目的：提供一种软掩模和辊模的制造方法和使用其的曝光装置，以在辊模的表面上形成图案，从而获得低成本的辊模，其用于卷 -roll印记过程。 构成：软掩模的制造方法包括：在树脂层上转印印模图案的步骤; 去除树脂层的剩余层的步骤（S12）; 通过图案蒸发基板上的金属并除去树脂层的步骤（S13）; 通过向基板的一侧施加压力来在树脂层的一侧上转印金属图案的步骤; 以及用与树脂膜相同的材料向下膜施加压力的步骤。 （附图标记）（AA）软掩模; （BB）金属卷; （S11）基板印记; （S12）基板蚀刻; （S13）金属沉积/树脂层去除; （S14）胶片倒印; （S15）较低的膜附着力; （S16）成型; （S21）卷帘密封; （S22）卷曝; （S23）滚动步进旋转; （S31）非曝光光敏剂去除; （S32）金属沉积; （S33）去除光敏剂