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公开(公告)号：US08227182B2
公开(公告)日：2012-07-24
申请号：US12539041
申请日：2009-08-11
Applicant: Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
Inventor： Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
CPC classification number: G03F7/168
Abstract: In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
Abstract translation: 在较薄的组合物和形成感光膜的方法中，较薄的组合物包括约50至约90重量％的丙二醇单甲醚乙酸酯，约1至约20重量％的丙二醇单甲醚，约1至约 10重量％的γ-丁内酯和约1至约20重量％的乙酸正丁酯。 更薄的组合物可以具有适当的挥发性和改善溶解各种感光材料的能力，因此较薄的组合物可有效地用于边缘珠漂洗工艺，返工工艺或预润湿工艺。
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公开(公告)号：US20100034962A1
公开(公告)日：2010-02-11
申请号：US12539041
申请日：2009-08-11
Applicant: Ahn-Ho LEE , Baik-Soon CHOI , Seung-Hyun AHN , Sang-Tae KIM , Yong-II KIM , Shi-Jin SUNG , Kyong-Ho LEE
Inventor： Ahn-Ho LEE , Baik-Soon CHOI , Seung-Hyun AHN , Sang-Tae KIM , Yong-II KIM , Shi-Jin SUNG , Kyong-Ho LEE
IPC: B05D3/10
CPC classification number: G03F7/168
Abstract: In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
Abstract translation: 在较薄的组合物和形成感光膜的方法中，较薄的组合物包括约50至约90重量％的丙二醇单甲醚乙酸酯，约1至约20重量％的丙二醇单甲醚，约1至约 10重量％的γ-丁内酯和约1至约20重量％的乙酸正丁酯。 更薄的组合物可以具有适当的挥发性和改善溶解各种感光材料的能力，因此较薄的组合物可有效地用于边缘珠漂洗工艺，返工工艺或预润湿工艺。
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3.发明授权Photosensitive-resin remover composition and method of fabricating semiconductor device using the same 有权光敏树脂去除剂组合物及使用该组合物的半导体器件的制造方法公开(公告)号：US08129322B2
公开(公告)日：2012-03-06
申请号：US13039501
申请日：2011-03-03
Applicant: Ahn-Ho Lee , Junghun Lim , Young Taek Hong , Hyuntak Kim , Seonghwan Park , Baiksoon Choi , Seunghyun Ahn , Byungil Lee
Inventor： Ahn-Ho Lee , Junghun Lim , Young Taek Hong , Hyuntak Kim , Seonghwan Park , Baiksoon Choi , Seunghyun Ahn , Byungil Lee
IPC: G03F7/42
CPC classification number: G03F7/42
Abstract: A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
Abstract translation: 光敏树脂去除剂组合物包括胺化合物和去离子水，去离子水的量基于组合物的总重量为约45重量％至约99重量％。
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4.发明申请PHOTOSENSITIVE-RESIN REMOVER COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME 有权光敏性树脂去除组合物及使用其制造半导体器件的方法公开(公告)号：US20110218134A1
公开(公告)日：2011-09-08
申请号：US13039501
申请日：2011-03-03
Applicant: Ahn-Ho Lee , Junghun Lim , Young Taek Hong , Hyuntak Kim , Seonghwan Park , Baiksoon Choi , Seunghyun Ahn , Byungil Lee
Inventor： Ahn-Ho Lee , Junghun Lim , Young Taek Hong , Hyuntak Kim , Seonghwan Park , Baiksoon Choi , Seunghyun Ahn , Byungil Lee
IPC: G03F7/42
CPC classification number: G03F7/42
Abstract: A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
Abstract translation: 光敏树脂去除剂组合物包括胺化合物和去离子水，去离子水的量基于组合物的总重量为约45重量％至约99重量％。
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