Piezoelectric deposition for BAW resonators
    1.
    发明申请
    Piezoelectric deposition for BAW resonators 审中-公开
    用于BAW谐振器的压电沉积

    公开(公告)号:US20090053401A1

    公开(公告)日:2009-02-26

    申请号:US11895454

    申请日:2007-08-24

    IPC分类号: B05D5/12

    摘要: Piezoelectric deposition for BAW resonators wherein a thin amorphous layer of AlN over the bottom electrode before depositing a second layer of AlN over the amorphous layer of AlN, the depositing occurring at a temperature allowing the deposited AlN to self-organize into a desired columnar phase. The bottom electrode may have acoustic isolation thereunder, such as a Bragg mirror. Various details of the fabrication process are disclosed.

    摘要翻译: 用于BAW谐振器的压电沉积,其中在在AlN的非晶层上沉积第二AlN层之前,在底电极上方形成薄的非晶层AlN,沉积在允许沉积的AlN自组织成所需柱状相的温度下发生。 底部电极可以在其下方具有声学隔离,例如布拉格反射镜。 公开了制造工艺的各种细节。