公开(公告)号：US09152058B2

公开(公告)日：2015-10-06

申请号：US13194136

申请日：2011-07-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

摘要翻译： 一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统 被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。

公开(公告)号：US07418902B2

公开(公告)日：2008-09-02

申请号：US11139991

申请日：2005-05-31

申请人： Yvonne Wendela Kruijt-Stegeman ,  Aleksey Yurievich Kolensnychenko ,  Helmar Van Santen ,  Erik Roelof Loopstra

发明人： Yvonne Wendela Kruijt-Stegeman ,  Aleksey Yurievich Kolensnychenko ,  Helmar Van Santen ,  Erik Roelof Loopstra

IPC分类号： B41F21/00

CPC分类号： B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。