公开(公告)号：US20070287081A1

公开(公告)日：2007-12-13

申请号：US11695469

申请日：2007-04-02

Applicant: Anshuman Cherala ,  Sidlgata Sreenivasan ,  Byung-Jin Choi ,  Ecron Thompson

Inventor： Anshuman Cherala ,  Sidlgata Sreenivasan ,  Byung-Jin Choi ,  Ecron Thompson

IPC: G03F9/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/703 ,  G03F7/70633 ,  G03F7/70783 ,  G03F9/7003 ,  G03F9/7092

Abstract: The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.

Abstract translation: 本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于 参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。

公开(公告)号：US20050100830A1

公开(公告)日：2005-05-12

申请号：US10694284

申请日：2003-10-27

Applicant: Frank Xu ,  Nicholas Stacey ,  Michael Watts ,  Ecron Thompson

Inventor： Frank Xu ,  Nicholas Stacey ,  Michael Watts ,  Ecron Thompson

IPC: G03C5/00 ,  G03F7/00 ,  H01L21/302 ,  H01L21/461

CPC classification number: B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

Abstract translation: 本发明的一个实施例是一种用于在衬底上产生图案化特征的方法，其包括：（a）在衬底的表面的至少一部分上形成第一层，第一层包括至少一层第一材料 其中一层邻接衬底的表面; （b）在所述第一层的至少一部分上形成第二材料的第二层，所述第二层被印刷所述图案化特征; （c）去除所述第二层的至少一部分以将所述图案化特征延伸到所述第一层; 和（d）去除所述第一层的至少一部分以将所述图案化特征延伸到所述基底; 其中第一层和第二层可以暴露于蚀刻过程，其蚀刻图案化的特征，并且第一材料可以被剥离。