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公开(公告)号:US07179431B2
公开(公告)日:2007-02-20
申请号:US09862176
申请日:2001-05-21
CPC分类号: F01N3/2853 , B01D53/885 , F01N3/28 , F01N2450/02 , Y10T29/49345
摘要: An embodiment of a method for producing a gas treatment device includes disposing a mat support material about a substrate to form a subassembly; passing at least a portion of the subassembly into a main body portion of a housing that has a first portion having a decreasing internal diameter from a first end to the main body portion, the main body portion extending from the first portion.
摘要翻译: 气体处理装置的制造方法的一个实施方式包括在基板周围设置垫支撑材料,形成子组件; 将所述子组件的至少一部分通过从所述第一部分延伸到所述主体部分的壳体的主体部分中,所述主体部分具有从第一端到所述主体部分具有减小的内径的第一部分。