Superlens and lithography systems and methods using same
    1.
    发明申请
    Superlens and lithography systems and methods using same 审中-公开
    超薄和光刻系统及其使用方法

    公开(公告)号:US20100033701A1

    公开(公告)日:2010-02-11

    申请号:US12228113

    申请日:2008-08-08

    IPC分类号: G03B27/54 G03B27/32

    摘要: A superlens that includes, in one example embodiment, a positive-index material adjacent to a negative-index material, wherein the negative-index material includes aluminum. In a more specific embodiment, the positive-index material includes a dielectric layer, such as Poly(Methyl MethAcrylate) (PMMA), which is less than 50 nanometers thick. The negative-index material includes a smoothed aluminum layer less than 50 nanometers thick. The aluminum layer is disposed on the dielectric layer or vice versa, forming a superlens comprising the aluminum layer and the dielectric layer. In another embodiment, the superlens further includes plural aluminum layers separated by one or more layers of positive-index material. A mask is adjacent to the positive-index material. The mask may include one or more features that extend into a transparent substrate. The mask is positioned so that the positive-index material separates the mask from the smoothed aluminum layer. In an illustrative embodiment, the superlens is adapted for use with thermal lithography using nanoparticles.

    摘要翻译: 在一个示例性实施例中,包括与负折射率材料相邻的正折射率材料的超薄体,其中负折射率材料包括铝。 在更具体的实施方案中,正指数材料包括介电层,例如小于50纳米厚的聚甲基丙烯酸甲酯(PMMA)。 负折射率材料包括小于50纳米厚的平滑的铝层。 铝层设置在电介质层上,反之亦然,形成包含铝层和电介质层的超薄层。 在另一个实施例中,超薄膜还包括由一层或多层正折射率材料隔开的多个铝层。 掩模与正指数材料相邻。 掩模可以包括延伸到透明基底中的一个或多个特征。 将掩模定位成使得正折射材料将掩模与平滑的铝层分离。 在说明性实施例中,超薄适用于使用纳米颗粒的热平版印刷。

    Far-field superlensing
    2.
    发明申请
    Far-field superlensing 审中-公开
    远场超镜

    公开(公告)号:US20110188032A1

    公开(公告)日:2011-08-04

    申请号:US12658342

    申请日:2010-02-04

    申请人: Ravi Verma Hyesog Lee

    发明人: Ravi Verma Hyesog Lee

    IPC分类号: G01N21/00 G02B3/00 G02B27/56

    CPC分类号: G01N21/00 G02B3/00 G02B27/56

    摘要: An apparatus for creating a sub-wavelength image in the farfield. In an example embodiment, the apparatus includes a far-field superlens that is adapted to generate a sub-wavelength image or a sub-diffraction-limited image at a far field distance from a negative-index material included in the superlens. The example far-field superlens includes a positive-index material and an adjacent positive-index material. The negative-index material has an output aperture at a first surface. A second surface or interface is positioned at a far field distance from the negative-index material such that a cavity or gap is formed between the second surface and the first surface, wherein the second surface represents an imaging surface. The gap may be filled with a dielectric material or may include a vacuum or air. In a more specific embodiment, the superlens further includes a first mechanism for producing one or more sub-diffraction-limited beam features at a far field distance from the negative-index layer via the cavity in which propagating electromagnetic energy from the incident electromagnetic energy propagates.

    摘要翻译: 一种在远场创建亚波长图像的装置。 在一个示例性实施例中,该装置包括远场超滤器,其适于在与包括在超滤镜中的负指数材料的远场距离处产生亚波长图像或副衍射限制图像。 示例性远场超薄包括正指数材料和相邻的正指数材料。 负折射率材料在第一表面具有输出孔径。 第二表面或界面位于与负折射率材料的远场距离处,使得在第二表面和第一表面之间形成空腔或间隙,其中第二表面代表成像表面。 间隙可以用电介质材料填充,或者可以包括真空或空气。 在更具体的实施例中,超薄体进一步包括第一机构,用于在距离负折射率层的远场距离处经由空腔产生一个或多个亚衍射受限束特征,其中来自入射电磁能的传播电磁能传播 。