NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

    公开(公告)号:US20240222100A1

    公开(公告)日:2024-07-04

    申请号:US18605526

    申请日:2024-03-14

    Abstract: An apparatus for in-situ etching monitoring in a plasma processing chamber includes a continuous wave broadband light source, an illumination system configured to illuminate an area on a substrate with an incident light beam being directed from the continuous wave broadband light source at normal incidence to the substrate, a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and to direct the reflected light beam to a first light detector, and a controller. The controller is configured to determine a property of the substrate or structures formed thereupon based on a reference light beam and the reflected light beam, and control an etch process based on the determined property. The reference light beam is generated by the illumination system by splitting a portion of the incident light beam and directed to a second light detector.

    SEMICONDUCTOR DEVICE INSPECTION METHOD AND SEMICONDUCTOR DEVICE INSPECTION APPARATUS

    公开(公告)号:US20190212252A1

    公开(公告)日:2019-07-11

    申请号:US16336238

    申请日:2017-07-04

    Abstract: A semiconductor device inspection method of inspecting a semiconductor device which is an inspection object includes: a step of inputting a stimulation signal to the semiconductor device; a step of acquiring a detection signal based on a reaction of the semiconductor device to which the stimulation signal has been input; a step of generating a first in-phase image and a first quadrature image including amplitude information and phase information in the detection signal based on the detection signal and a reference signal generated based on the stimulation signal; and a step of performing, a filtering process of reducing noise on at least one of the first in-phase image and the first quadrature image and then generating a first amplitude image based on the first in-phase image and the first quadrature image.

    IMAGING BIOLOGICAL TISSUE OR OTHER SUBJECTS
    8.
    发明申请

    公开(公告)号:US20190082961A1

    公开(公告)日:2019-03-21

    申请号:US16136983

    申请日:2018-09-20

    Abstract: A system may include emitters configured to emit radiation at a first wavelength of electromagnetic (EM) radiation and a second wavelength of EM radiation towards a biological tissue, and receivers configured to receive responses to the first and second wavelengths of EM radiation after the wavelengths of EM radiation interact with the biological tissue. The system may also include a signal mixer unit configured to perform operations that include replicate and mix first signals representative of the responses to the first wavelength of EM radiation received by the receivers and second signals representative of the responses to the second wavelength of EM radiation received by the receivers to generate a set of spectro-spatial responses, replicate and mix the spectro-spatial responses to generate markers, and replicate and mix the markers and user-selected markers to output a sequence associated with characterization of the biological tissue.

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