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公开(公告)号:US06664029B1
公开(公告)日:2003-12-16
申请号:US09582557
申请日:2000-08-30
申请人: Genji Imai , Kengo Ohnishi , Hiroyuki Honma , Hideo Kogure
发明人: Genji Imai , Kengo Ohnishi , Hiroyuki Honma , Hideo Kogure
IPC分类号: G03F700
CPC分类号: H01J11/44 , G03F7/0007 , G03F7/094 , G03F7/30 , H05K1/0306 , H05K3/28 , H05K2203/0585
摘要: A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.
摘要翻译: 一种图案形成方法,包括以下步骤:(1)将光化学射线固化涂膜层层压到绝缘膜形成树脂层的表面上;(2)直接或通过光掩模照射光化射线或主波 (3)使光化学射线固化性涂膜进行显影处理,形成由光化固化性涂膜层构成的抗蚀剂图案涂膜,(4),对绝缘体 成膜树脂层进行显影处理,然后除去。