公开(公告)号：US06664029B1

公开(公告)日：2003-12-16

申请号：US09582557

申请日：2000-08-30

申请人： Genji Imai ,  Kengo Ohnishi ,  Hiroyuki Honma ,  Hideo Kogure

发明人： Genji Imai ,  Kengo Ohnishi ,  Hiroyuki Honma ,  Hideo Kogure

IPC分类号： G03F700

CPC分类号： H01J11/44 ,  G03F7/0007 ,  G03F7/094 ,  G03F7/30 ,  H05K1/0306 ,  H05K3/28 ,  H05K2203/0585

摘要： A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.

摘要翻译： 一种图案形成方法，包括以下步骤：（1）将光化学射线固化涂膜层层压到绝缘膜形成树脂层的表面上;（2）直接或通过光掩模照射光化射线或主波 （3）使光化学射线固化性涂膜进行显影处理，形成由光化固化性涂膜层构成的抗蚀剂图案涂膜，（4），对绝缘体 成膜树脂层进行显影处理，然后除去。

公开(公告)号：US06331376B1

公开(公告)日：2001-12-18

申请号：US09582846

申请日：2000-07-05

申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

IPC分类号： G03F7029

CPC分类号： G03F7/027 ,  C08F290/067 ,  C08G18/672 ,  C08G18/7642 ,  G03F7/0388 ,  C08G18/48 ,  C08G18/0823

摘要： An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

摘要翻译： 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示： - OOCHN-A-NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元，并且任选地含有 醚键，R1是衍生自含羧基的多元醇化合物的结构单元，R2是衍生自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个 X和一个Y彼此键合，或者X和/或Y中的三个或更多个彼此键合。

公开(公告)号：US06699646B2

公开(公告)日：2004-03-02

申请号：US09996085

申请日：2001-09-13

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： G03F7039

CPC分类号： G03F7/30 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2006 ,  G03F7/2053 ,  G03F7/322 ,  Y10S430/146

摘要： A liquid or a solid positive type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm, wherein an absorbancy of an unexposed film formed from this composition is 0.5 or less within the range of the maximum wavelength ±30 nm selected from the range of the maximum wavelength of the safelight; and a method for forming a resist pattern is also disclosed which comprises (1) a step of applying a positive type photosensitive resin composition onto a substrate to form a photosensitive film thereon, (2) a step of exposing the photosensitive film so as to obtain a desired pattern, and (3) a step of performing a developing treatment to form a resist pattern, wherein at least one step of the steps (1) to (3) is carried out under the irradiation circumstance of the safelight having a high spectral luminous efficiency in which the maximum wavelength of an emission spectrum of a light source is within the range of 500 to 620 nm.

摘要翻译： 本文公开了一种液体或固体正型感光性树脂组合物，其在最大波长在500〜620nm范围内的安全灯的照射环境下使用，其中由该组合物形成的未曝光膜的吸收性为0.5或 在从安全灯的最大波长的范围内选择的最大波长±30nm的范围内较少; 还公开了形成抗蚀剂图案的方法，其包括（1）将正型感光性树脂组合物涂布在基板上以在其上形成感光性膜的工序，（2）使感光膜曝光的工序，得到 期望的图案，（3）进行显影处理以形成抗蚀剂图案的步骤，其中步骤（1）至（3）的至少一个步骤在具有高光谱的安全灯的照射环境下进行 光源的发射光谱的最大波长在500〜620nm的范围内的发光效率。

公开(公告)号：US06420090B1

公开(公告)日：2002-07-16

申请号：US09453504

申请日：1999-12-03

申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

IPC分类号： G03F7037

CPC分类号： G03F7/164 ,  G03F7/027

摘要： A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane compound.

摘要翻译： 含有具有由下式表示的重复单元的光聚合性聚氨酯化合物的液体光固化性组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示：-OOCHN-A -NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团且任选地含有醚键的羟基化合物的结构单元， R1是衍生自含羧基的多元醇化合物的结构单元，R2是来自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个X和一个 Y彼此键合，或者X和/或Y中的三个或更多个彼此键合，并且任选地含有除光聚合性聚氨酯化合物以外的光聚合性化合物。

公开(公告)号：US06344307B1

公开(公告)日：2002-02-05

申请号：US09673316

申请日：2000-10-13

申请人： Daisuke Kojima ,  Osamu Isozaki ,  Hideo Kogure ,  Genji Imai

发明人： Daisuke Kojima ,  Osamu Isozaki ,  Hideo Kogure ,  Genji Imai

IPC分类号： G03F7027

CPC分类号： G03F7/0392 ,  C08F2/48 ,  G03F7/0045

摘要： A photosensitive resin composition characterized by comprising (A) a resin having at least one aprotic onium salt represented by the general formula: —COO−·W+  (1) and/or the general formula: (in each of the above general formulas, W+ represents wherein, Z represents a nitrogen atom or phosphorus atom; Y represents a sulfur atom; R1, R2, R3 and R4 each represents an organic group having 1 to 30 carbon atoms), (B) a compound having two or more vinylether groups in a molecule and (C) a compound which generates an acid upon irradiation with actinic energy rays.

摘要翻译： 一种感光性树脂组合物，其特征在于，包含（A）具有至少一种由以下通式表示的非质子性盐的树脂：和/或通式：（在上述通式的每一个中，W +表示，其中Z表示氮原子或 磷原子; Y表示硫原子; R1，R2，R3和R4各自表示碳原子数1〜30的有机基），（B）分子中具有2个以上的乙烯基醚基的化合物，（C） 在光化能量射线照射时产生酸。

公开(公告)号：US06106999A

公开(公告)日：2000-08-22

申请号：US131418

申请日：1998-08-10

申请人： Akira Ogiso ,  Tsutami Misawa ,  Taizo Nishimoto ,  Hisashi Tsukahara ,  Keisuke Takuma ,  Kenichi Sugimoto ,  Takeshi Tsuda ,  Genji Imai ,  Hideo Kogure

发明人： Akira Ogiso ,  Tsutami Misawa ,  Taizo Nishimoto ,  Hisashi Tsukahara ,  Keisuke Takuma ,  Kenichi Sugimoto ,  Takeshi Tsuda ,  Genji Imai ,  Hideo Kogure

IPC分类号： C08F2/00 ,  G03F7/029 ,  G03C1/105

CPC分类号： G03F7/029 ,  Y10S430/114 ,  Y10S430/127

摘要： A visible light curable resin composition containing a photocurable resin, a photoreaction initiator and a photosensitizer having the formula (1). The composition has a very high sensitivity to a general-purpose visible light laser, so that a high-speed scanning exposure is possible by the laser, and an extremely fine high resolution can be obtained. In addition, the composition can be used for coating or printing under safelight irradiating conditions and under bright circumstantial conditions without any thickening of the composition, and hence the composition can exert excellent noticeable effects in points of safe operativity, operational efficiency and the stability of products. Formula (1) is as follows: ##STR1## wherein rings X.sub.1 and X.sub.2 are each an optionally substituted pyrrole ring; Y is H, CN, optionally substituted alkyl, aralkyl, aryl, heteroaryl or alkenyl group; and Z.sub.1 and Z.sub.2 are halogen, optionally substituted alkyl, alkoxy, alkylthio, aralkyl, aralkyloxy, aryl, aryloxy, arylthio, heteroaryl, heteroaryloxy or heteroarylthio group, provided that at least one of substituents on the pyrrole rings X.sub.1 and X.sub.2, groups Z.sub.1 and Z.sub.2 is the alkoxy, aralkyloxy or aryloxy group.

摘要翻译： 一种含有光固化树脂，光反应引发剂和具有式（1）的光敏剂的可见光固化树脂组合物。 该组合物对通用可见光激光器具有非常高的灵敏度，使得可以通过激光进行高速扫描曝光，并且可以获得非常好的高分辨率。 此外，该组合物可以在安全照射条件下和明亮的环境条件下用于涂布或印刷，而不会使组合物变厚，因此组合物可以在安全操作性，操作效率和产品稳定性方面发挥出色的显着效果 。 式（1）如下：其中环X1和X2各自为任选取代的吡咯环; Y是H，CN，任选取代的烷基，芳烷基，芳基，杂芳基或烯基; 并且Z 1和Z 2是卤素，任选取代的烷基，烷氧基，烷硫基，芳烷基，芳烷氧基，芳基，芳氧基，芳硫基，杂芳基，杂芳氧基或杂芳硫基，条件是吡咯环X1和X2上的至少一个取代基， Z2是烷氧基，芳烷氧基或芳氧基。

公开(公告)号：US5939148A

公开(公告)日：1999-08-17

申请号：US925675

申请日：1997-09-09

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： C08F2/50 ,  C08F4/649 ,  G03F7/029 ,  G03C1/735 ,  G03F7/028

CPC分类号： G03F7/029

摘要： The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.

公开(公告)号：US06660457B1

公开(公告)日：2003-12-09

申请号：US09831892

申请日：2001-05-23

申请人： Genji Imai ,  Hideo Kogure ,  Daisuke Kojima

发明人： Genji Imai ,  Hideo Kogure ,  Daisuke Kojima

IPC分类号： G03C500

CPC分类号： G03F7/40 ,  G03F7/0007 ,  G03F7/093 ,  G03F7/11 ,  H05K1/092 ,  H05K3/0082 ,  H05K3/06 ,  H05K3/064 ,  H05K2201/0129 ,  H05K2203/107

摘要： The present invention provides a method of forming a conductive pattern, comprising the steps of: (1) depositing a conductive coating-forming resin layer and an energy beam-sensitive coating layer on a substrate in this order; (2) irradiating a surface of the energy beam-sensitive coating layer with an active energy beam or heat rays directly or through a mask, so as to obtain a desired pattern; (3) developing the energy beam-sensitive coating layer to form a resist pattern coating from the energy beam-sensitive coating layer; and (4) removing revealed portions of the conductive coating-forming resin layer by development. The present invention also provides a method of forming a conductive pattern, comprising the step (1), the step (2), and the step of: (3′) developing the energy beam-sensitive coating layer and the conductive coating-forming resin layer simultaneously.

摘要翻译： 本发明提供一种形成导电图案的方法，包括以下步骤：（1）依次在基片上沉积导电涂层形成树脂层和能量束敏感涂层;（2） 具有活性能量束的能量束敏感性涂层或直接或通过掩模的热射线，以获得期望的图案;（3）显影能量束敏感涂层以从能量束形成抗蚀剂图案涂层 敏感涂层; 本发明还提供形成导电图案的方法，其包括步骤（1），步骤（2）和（ 3'）同时开发能量束敏感性涂层和导电涂层形成树脂层。

公开(公告)号：US6093518A

公开(公告)日：2000-07-25

申请号：US245028

申请日：1999-02-05

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： C08F2/50 ,  G03F7/029 ,  G03C1/675 ,  G03F7/028 ,  G03F7/031 ,  G03F7/30

CPC分类号： G03F7/029 ,  C08F2/50 ,  Y10S430/126 ,  Y10S430/127 ,  Y10S430/146 ,  Y10S430/148

摘要： The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.

摘要翻译： 本发明提供一种可见光激光固化型感光性组合物，其中具有可曝光或可聚合的光敏基团的光固化树脂与由特定结构的香豆素型颜料和二茂钛化合物组成的光聚合引发剂体系混合。 该组合物对可见激光具有出乎意料的高灵敏度。

公开(公告)号：US6140025A

公开(公告)日：2000-10-31

申请号：US154047

申请日：1998-09-16

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： G03F7/028 ,  C08L63/00 ,  C08L101/00 ,  C09D201/00 ,  G03F7/038 ,  G03F7/20 ,  H05K3/00 ,  H05K3/06 ,  G03F7/30

CPC分类号： G03F7/20 ,  G03F7/038

摘要： A negative type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm and a large spectral luminous efficiency; the composition being a liquid or a solid resin composition containing a photocurable resin, a photoreaction initiator and if necessary, a photosensitizing dye; an absorbancy of an unexposed film formed from this composition being 0.5 or less within the range of the maximum wavelength .+-.30 nm selected from the range of the maximum wavelength of the safelight. By the use of this negative type photosensitive resin composition, it is possible to form a resist pattern which is excellent in safe operativity, operational efficiency, the quality stability of products, and the like.

摘要翻译： 本发明公开了一种负极型感光性树脂组合物，其在最大波长在500〜620nm范围内的安全灯的照射环境下使用，光谱发光效率高; 所述组合物是含有光固化树脂，光反应引发剂和必要时的光敏染料的液体或固体树脂组合物; 从该组合物形成的未曝光膜在从安全灯的最大波长范围选择的最大波长+/- 30nm的范围内为0.5以下的吸光度。 通过使用这种负型感光性树脂组合物，可以形成安全操作性，操作效率，产品质量稳定性等优异的抗蚀剂图案。