公开(公告)号：US3622331A

公开(公告)日：1971-11-23

申请号：US3622331D

申请日：1969-06-23

Applicant: LITHOPLATE INC

Inventor： THOMAS DANIEL C

IPC: C08G63/64 ,  C08G64/04 ,  G03F7/038 ,  C08G17/13

CPC classification number: C08G63/64 ,  C08G64/045 ,  G03F7/038 ,  Y10S525/925

Abstract: A polycarbonate resin is reacted with a cinnamoylating agent such as cinnamoyl chloride to produce a novel photopolymer, a polycarbonate-cinnamate resin. The photopolymers are useful for making photoresist plates and presensitized negative-working printing plates.

公开(公告)号：US3307951A

公开(公告)日：1967-03-07

申请号：US25567363

申请日：1963-02-01

Applicant: LITHOPLATE INC

Inventor： ADAMS DOLOR N ,  THOMAS DANIEL C

IPC: B41N3/03

CPC classification number: B41N3/038

公开(公告)号：US3073723A

公开(公告)日：1963-01-15

申请号：US76504358

申请日：1958-10-03

Applicant: LITHOPLATE INC

Inventor： DEAL ELMER F ,  RICHLIN ISADORE M ,  WILSON BRUCE W

IPC: B41N3/03

CPC classification number: G03F7/038 ,  B41C1/1016 ,  B41C2210/04 ,  B41C2210/14 ,  B41C2210/20 ,  B41C2210/26 ,  B41C2210/262 ,  B41C2210/266 ,  B41N3/036 ,  Y10T428/31627 ,  Y10T428/31688 ,  Y10T428/31957 ,  Y10T428/31964

公开(公告)号：US3655625A

公开(公告)日：1972-04-11

申请号：US3655625D

申请日：1969-07-28

Applicant: LITHOPLATE INC

Inventor： THOMAS DANIEL C

IPC: C08G18/83 ,  G03F7/038

CPC classification number: G03F7/038 ,  C08G18/831 ,  Y10S430/107

Abstract: A BLOCKED POLYURETHANE RESIN, ISOCYANATE TERMINATED, WITH ISOCYANATE GROUPS TREATED WITH PHENOL, AND THEN HEATED TO DRIVE OFF THE PHENOL AND REACTED WITH A POLYOL, IS REACTED WITH A CINNAMOLYLATING AGENT TO MAKE A POLYURETHANE CINNAMATE WHICH IS A PHOTOPOLMER.

公开(公告)号：US3386850A

公开(公告)日：1968-06-04

申请号：US57485166

申请日：1966-07-13

Applicant: LITHOPLATE INC

Inventor： ADAMS DOLOR N ,  THOMAS DANIEL C

IPC: B41N3/03

CPC classification number: B41N3/03 ,  Y10S428/913 ,  Y10T428/31688

公开(公告)号：US3232783A

公开(公告)日：1966-02-01

申请号：US24631462

申请日：1962-12-21

Applicant: LITHOPLATE INC

Inventor： DEAL ELMER F ,  RICHLIN ISADORE M ,  WILSON BRUCE W

IPC: B41N3/03

CPC classification number: G03F7/038 ,  B41C1/1016 ,  B41C2210/04 ,  B41C2210/14 ,  B41C2210/20 ,  B41C2210/26 ,  B41C2210/262 ,  B41C2210/266 ,  B41N3/036 ,  Y10T428/31627 ,  Y10T428/31688 ,  Y10T428/31957 ,  Y10T428/31964

公开(公告)号：US3737407A

公开(公告)日：1973-06-05

申请号：US3737407D

申请日：1971-06-01

Applicant: LITHOPLATE INC

Inventor： THOMAS D

IPC: C08F283/01 ,  C08G63/547 ,  C08G63/676 ,  G03F7/038 ,  C08G17/10 ,  C08G17/14

CPC classification number: G03F7/038 ,  C08F283/01 ,  C08G63/547 ,  C08G63/676 ,  C08F2/46

Abstract: BISPHENOL-A-FUMARATE POLYESTER RESIN IS REACTED WITH A CINNAMOYLATING AGENT, SUCH AS CINNAMOYL CHLORIDE, TO GIVE A PHOTOPOLYMER, USEFUL IN LITHOGRAPHIC PLATES.

公开(公告)号：US3652272A

公开(公告)日：1972-03-28

申请号：US3652272D

申请日：1969-10-31

Applicant: LITHOPLATE INC

Inventor： THOMAS DANIEL C

IPC: C08L71/00 ,  G03F7/021 ,  G03F7/038 ,  G03F7/04 ,  G03F7/02 ,  G03C1/52 ,  G03C1/68

CPC classification number: G03F7/0212 ,  C08L71/00 ,  G03F7/038 ,  G03F7/04

Abstract: A photopolymer adapted for use in lithography, photomechanical processes, or other applications, consisting essentially of an actinic light-tanned product of a phenoxy resin of high molecular weight formed in the presence of a sensitizer which is a diazo resin or a chromium compound, such as ammonium bichromate. A photopolymer-yielding system or combination consisting essentially of a phenoxy resin and a sensitizer, which is a diazo resin or chromium compound yielding hexavalent chromium, the resin and sensitizer being in contact with each other. A lithographic plate including such photopolymer or such photopolymer-yielding system or combination. A method of making such photopolymer, comprising subjecting such photopolymer system or combination to treatment with actinic light.

Abstract translation: 适用于光刻，光机械工艺或其它应用的光聚合物，其基本上由在作为重氮树脂或铬化合物的敏化剂存在下形成的高分子量苯氧基树脂的光化鞣制产品 作为重铬酸铵。 产生感光聚合物的系统或组合物，其基本上由苯氧基树脂和敏化剂组成，其是重氮树脂或产生六价铬的铬化合物，所述树脂和敏化剂彼此接触。 包括这种光聚合物或这种光聚合物产生系统或组合的平版印刷版。 制备这种光聚合物的方法，包括使这种光聚合物体系或组合物经光化光处理。

公开(公告)号：US3549365A

公开(公告)日：1970-12-22

申请号：US3549365D

申请日：1966-02-18

Applicant: LITHOPLATE INC

Inventor： THOMAS DANIEL C

IPC: B41N3/03 ,  G03F7/02

CPC classification number: B41N3/03

公开(公告)号：US3064562A

公开(公告)日：1962-11-20

申请号：US78603459

申请日：1959-01-12

Applicant: LITHOPLATE INC

Inventor： DEAL ELMER F

IPC: B41N3/03

CPC classification number: G03F7/0163 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  B41N3/036 ,  G03F7/021 ,  G03F7/04 ,  Y10S430/136