SUPPLYING RF POWER TO A PLASMA PROCESS
    1.
    发明申请
    SUPPLYING RF POWER TO A PLASMA PROCESS 有权
    向等离子体处理提供射频功率

    公开(公告)号:US20070044715A1

    公开(公告)日:2007-03-01

    申请号:US11464000

    申请日:2006-08-11

    IPC分类号: C23C16/00

    摘要: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

    摘要翻译: 产生至少两个向等离子体处理提供RF功率的RF功率发生器的驱动信号,其中在RF发生器驱动器中产生驱动一个RF功率发生器的至少两个驱动信号。 每个驱动信号由发电机驱动器的相应功能发生器(例如数字正弦发生器)产生。

    Supplying RF power to a plasma process
    2.
    发明授权
    Supplying RF power to a plasma process 有权
    向等离子体工艺提供射频功率

    公开(公告)号:US07981306B2

    公开(公告)日:2011-07-19

    申请号:US11464000

    申请日:2006-08-11

    IPC分类号: B44C1/22 H01L21/302

    摘要: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

    摘要翻译: 产生至少两个向等离子体处理提供RF功率的RF功率发生器的驱动信号,其中在RF发生器驱动器中产生驱动一个RF功率发生器的至少两个驱动信号。 每个驱动信号由发电机驱动器的相应功能发生器(例如数字正弦发生器)产生。