摘要:
One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ejφCf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ejφCr, an isolation in the forward direction determined from the equation If=If·ejφIf, and an isolation in the reverse direction determined from the equation Ir=Ir·ejφIr, wherein at least one condition is met from among the group consisting of: (1) the absolute value of Δφ=φCr+φCf−(φIr+φIf) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.
摘要翻译:本发明的一个方面包括定向耦合器,其具有从方程Cf = Cf.ejphiCf确定的正向耦合因子,从方程Cr = Cr.ejphiCr确定的相反方向的耦合因子,向前方向的隔离 从方程If = If.ejphiIf确定,并且从方程Ir = Ir.ejphiIr确定的相反方向的隔离,其中满足以下组中的至少一个条件:(1)Deltaphi = phiCr + phiCf-(phiIr + phiIf)小于或等于20°,K = C f C r * I r I f(2)小于或等于1.6,(3)Cf = Cr,If = Ir。
摘要:
In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h′, h′1, h′2) is further determined as a second measurement value, in particular, by means of the time difference (Δt) between the zero passages of the auxiliary signals (h, h′, h′1, h′2).
摘要:
A plasma power supply controller jointly monitors a plurality of plasma power supply devices of one or more electrical loads. The controller includes at least one signal input, at least one signal output connected to at least one first logic switching device configured to actuate a first power interrupter of at least one of the plasma power supply devices, and a safety switching device. The at least one signal input is configured to receive indication signals of at least one indication device. The safety switching device is configured to detect a state or a state change of at least one of the indication devices and to interrupt the current supply of at least one of the plasma power supply devices using the first logic switching device upon a detection of a predetermined state or upon a detection of a state change of at least one of the indication devices.
摘要:
A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.
摘要:
A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.
摘要:
For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.
摘要:
One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ejφCf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ejφCr, an isolation in the forward direction determined from the equation If=If·ejφIf, and an isolation in the reverse direction determined from the equation Ir=Ir·ejφIr, wherein at least one condition is met from among the group consisting of: (1) the absolute value of Δφ=φCr+φCf−(φIr+φIf) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.
摘要翻译:本发明的一个方面包括定向耦合器,其具有从方程Cf = Cf·ej&phgr; Cf确定的正向耦合因子,从方程Cr = Cr·ej&phgr; Cr确定的相反方向的耦合因子,隔离 在从方程If = If·ej&phgr; If和从方程Ir = Ir·ej&phgr; Ir确定的反向隔离中确定的正向,其中满足以下组中的至少一个条件:( 1)绝对值&Dgr;&phgr; =&phgr; Cr +&phgr; Cf - (&phgr; Ir +&phgr; If)小于或等于20°,K = C f C r * I r I f(2 )小于或等于1.6,(3)Cf = Cr,If = Ir。
摘要:
In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h′, h′1, h′2) is further determined as a second measurement value, in particular, by means of the time difference (Δt) between the zero passages of the auxiliary signals (h, h′, h′1, h′2).
摘要:
A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.
摘要:
The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.