Infrared detection element array and method for fabricating the same
    1.
    发明授权
    Infrared detection element array and method for fabricating the same 失效
    红外线检测元件阵列及其制造方法

    公开(公告)号:US5583058A

    公开(公告)日:1996-12-10

    申请号:US244079

    申请日:1994-05-17

    摘要: An object of the present invention is to provide a highly integrated infrared detecting element array having infrared detecting elements which are disposed at a high density and have a low heat capacity each. An insulator film 2 is provided on a silicon substrate 1 having upper surface in a {100} plane; opening portions are defined by etching right-angled triangular portions defined at four corners of each of right-angled quadrilaterals arranged in matrix array and enclosed by two orthogonally crossing pairs of parallel linear portions extending on the insulator film a pyramid cavity; 3 is defined into the silicon substrate underlying the insulator film 2 by anisotropically etching the silicon substrate; and infrared detecting elements are formed on the insulator film 2.

    摘要翻译: PCT No.PCT / JP93 / 01328 Sec。 371日期:1994年5月17日 102(e)日期1994年5月17日PCT提交1993年9月16日PCT公布。 公开号WO94 / 07115 日本特开1994年3月31日本发明的目的是提供一种高度集成的红外线检测元件阵列,其具有红外线检测元件,其以高密度设置并且各自具有低热容量。 绝缘膜2设置在具有{100}平面中的上表面的硅衬底1上; 通过蚀刻在矩阵阵列中布置的每个直角四边形的四个角处限定的直角三角形部分限定开口部分,并且由在绝缘膜上延伸的金字塔空腔的两个平行直线部分的两个正交交叉的对包围; 3通过各向异性蚀刻硅衬底被限定在绝缘膜2下面的硅衬底中; 并且在绝缘膜2上形成红外线检测元件。