Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
    1.
    发明申请
    Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative 失效
    高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法

    公开(公告)号:US20060229451A1

    公开(公告)日:2006-10-12

    申请号:US10568347

    申请日:2004-09-22

    IPC分类号: C07D215/14

    CPC分类号: C07D215/14

    摘要: A process for producing a high purity 3,5-dihydroxy6-heptenoic acid derivative by controlling the content of impurities such as denatured substances, is provided. When a 3,5-dihydroxy-6-heptenoic acid derivative is produced by a process which comprises a step of contacting the 3,5-dihydroxy-6-heptenoic acid derivative of the formula (1) wherein R is a C1-4 alkyl group, with a C1-4 lower alcohol-containing solvent, an alcohol containing solvent having its content of an oxidizing substance lowered, is used to at most 0.05 molar equivalent to a 3,5-dihydroxy-6-heptenoic acid derivative, to suppress impurities contained in the 3,5-dihydroxy-6heptenoic acid derivative.

    摘要翻译: 提供了通过控制诸如变性物质等杂质的含量来生产高纯度3,5-二羟基-6-庚烯酸衍生物的方法。 当3,5-二羟基-6-庚烯酸衍生物通过包括使式(1)的3,5-二羟基-6-庚烯酸衍生物与其中R为C 1 -C 6烷基的式 1-4 C 1-4烷基与含C 1-4低级醇的溶剂,其含有氧化物质含量的醇的溶剂的含量最低为0.05摩尔当量 与3,5-二羟基-6-庚烯酸衍生物反应,以抑制3,5-二羟基-6-庚烯酸衍生物中所含的杂质。

    Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
    2.
    发明授权
    Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative 失效
    高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法

    公开(公告)号:US07692018B2

    公开(公告)日:2010-04-06

    申请号:US10568347

    申请日:2004-09-22

    IPC分类号: C07D215/12

    CPC分类号: C07D215/14

    摘要: A process for producing a high purity 3,5-dihydroxy6-heptenoic acid derivative by controlling the content of impurities such as denatured substances, is provided. When a 3,5-dihydroxy-6-heptenoic acid derivative is produced by a process which comprises a step of contacting the 3,5-dihydroxy-6-heptenoic acid derivative of the formula (1) wherein R is a C1-4 alkyl group, with a C1-4 lower alcohol-containing solvent, an alcohol containing solvent having its content of an oxidizing substance lowered, is used to at most 0.05 molar equivalent to a 3,5-dihydroxy-6-heptenoic acid derivative, to suppress impurities contained in the 3,5-dihydroxy-6heptenoic acid derivative.

    摘要翻译: 提供了通过控制诸如变性物质等杂质的含量来生产高纯度3,5-二羟基-6-庚烯酸衍生物的方法。 当3,5-二羟基-6-庚烯酸衍生物通过包括使式(1)的3,5-二羟基-6-庚烯酸衍生物与其中R为C 1-4烷基的式 使用含有低级醇的C 1-4的溶剂,将含有氧化物质含量的醇的溶剂降低至与3,5-二羟基-6-庚烯酸衍生物最多0.05摩尔当量以抑制 杂质含在3,5-二羟基-6-庚烯酸衍生物中。