公开(公告)号：US08383303B2

公开(公告)日：2013-02-26

申请号：US13029544

申请日：2011-02-17

Applicant: Yi-Peng Kuo ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

Inventor： Yi-Peng Kuo ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

IPC: G02B5/20

CPC classification number: G02B5/22

Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014Ω/□, and an optical density (OD) of each of the bumps is above 1.5.

Abstract translation: 滤色器包括透明基板，透明导电层，多个滤光层和多个凸块。 滤光层设置在透明基板和透明导电层之间，凸块设置在透明导电层的平面上。 每个凸块的薄层电阻高于1014＆OHgr; /□，并且每个凸块的光密度（OD）高于1.5。

公开(公告)号：US20130078556A1

公开(公告)日：2013-03-28

申请号：US13407733

申请日：2012-02-28

Applicant: Feng-Chin Tang ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

Inventor： Feng-Chin Tang ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

IPC: G03F7/20 ,  C08L33/10 ,  B05D5/06 ,  C08K5/101 ,  C08K5/07 ,  G03F7/028 ,  C08K5/3445

CPC classification number: G03F7/0007 ,  C08F2222/1093 ,  C08G65/3322 ,  C08L63/10 ,  C08L2205/05 ,  G02F1/133516 ,  G03F7/0035 ,  G03F7/027 ,  G03F7/032 ,  G03F7/40 ,  C08L33/00

Abstract: A method for forming multicolor color filters is disclosed. First, a first patterned color layer is formed on a substrate. Second, a second patterned color layer and a third patterned color layer are respectively formed on the substrate with the first patterned color layer. Then the first patterned color layer, the second patterned color layer and the third patterned color layer are baked together to simultaneously transform the first patterned color layer, the second patterned color layer and the third patterned color layer to respectively become a first pixel color layer, a second pixel color layer and a third pixel color layer of the multicolor color filters, respectively.

Abstract translation: 公开了一种用于形成多色滤色器的方法。 首先，在基板上形成第一图案化着色层。 第二，第二图案化彩色层和第三图案化彩色层分别在第一图案化彩色层的衬底上形成。 然后将第一图案化彩色层，第二图案化彩色层和第三图案化彩色层一起烘烤，以同时变换第一图案化彩色层，第二图案化彩色层和第三图案化彩色层，分别成为第一像素彩色层， 多色滤色器的第二像素彩色层和第三像素彩色层。

公开(公告)号：US20120147492A1

公开(公告)日：2012-06-14

申请号：US13029544

申请日：2011-02-17

Applicant: Yi-Peng KUO ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

Inventor： Yi-Peng KUO ,  Wen-Jen Hsieh ,  Ying-Hung Chuang

IPC: G02B5/22

CPC classification number: G02B5/22

Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014Ω/□, and an optical density (OD) of each of the bumps is above 1.5.

Abstract translation: 滤色器包括透明基板，透明导电层，多个滤光层和多个凸块。 滤光层设置在透明基板和透明导电层之间，凸块设置在透明导电层的平面上。 每个凸块的薄层电阻高于1014＆OHgr; /□，并且每个凸块的光密度（OD）高于1.5。

公开(公告)号：US20110189597A1

公开(公告)日：2011-08-04

申请号：US12775931

申请日：2010-05-07

Applicant: Wen-Jen HSIEH ,  Ying-Hung Chuang ,  Feng-Chin Tang

Inventor： Wen-Jen HSIEH ,  Ying-Hung Chuang ,  Feng-Chin Tang

IPC: G03F1/00 ,  G03F7/20

CPC classification number: G03F1/00 ,  G03F7/20

Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.

Abstract translation: 本发明公开了一种形成曝光图案的方法。 本发明方法的这些步骤包括：提供基底; 在衬底上形成光致抗蚀剂层; 随后，将具有图案的光掩模放置并对准至光致抗蚀剂层上的相应位置，以进行至少两次曝光处理，并且将具有图案的光掩模移动并对准至少一个光致抗蚀剂层上的另一对应位置 曝光过程; 依次提供至少一个滤光器以执行至少一个曝光处理，并且将滤光器放置在光掩模的上方或下方; 因此在后续显影过程中部分光致抗蚀剂被去除之后，因此在基板上形成具有不同尺寸的图案。

公开(公告)号：US08399162B2

公开(公告)日：2013-03-19

申请号：US12775931

申请日：2010-05-07

Applicant: Wen-Jen Hsieh ,  Ying-Hung Chuang ,  Feng-Chin Tang

Inventor： Wen-Jen Hsieh ,  Ying-Hung Chuang ,  Feng-Chin Tang

IPC: G02B5/20

CPC classification number: G03F1/00 ,  G03F7/20

Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.

Abstract translation: 本发明公开了一种形成曝光图案的方法。 本发明方法的这些步骤包括：提供基底; 在衬底上形成光致抗蚀剂层; 随后，将具有图案的光掩模放置并对准至光致抗蚀剂层上的相应位置，以进行至少两次曝光处理，并且将具有图案的光掩模移动并对准至少一个光致抗蚀剂层上的另一对应位置 曝光过程; 依次提供至少一个滤光器以执行至少一个曝光处理，并且将滤光器放置在光掩模的上方或下方; 因此在后续显影过程中部分光致抗蚀剂被去除之后，因此在基板上形成具有不同尺寸的图案。

公开(公告)号：US5946519A

公开(公告)日：1999-08-31

申请号：US912626

申请日：1997-08-18

Applicant: Chih-Chien Chao ,  Chun-Hsiung Yen ,  Ying-Hung Chuang ,  Keh-Chung Su

Inventor： Chih-Chien Chao ,  Chun-Hsiung Yen ,  Ying-Hung Chuang ,  Keh-Chung Su

IPC: H01J9/227 ,  G03B41/00 ,  H01J29/12

CPC classification number: H01J9/2272

Abstract: Apparatus for use as a lighthouse in the manufacture of a color cathode ray tube (CRT) includes a housing with a cover lens. Disposed within the housing is a light source assembly including a light source in the form of a cylindrical shaped mercury lamp and an optical aperture closely spaced to the mercury lamp. The mercury lamp directs light through the optical aperture as well as through the cover lens onto the inner surface of the CRT's glass faceplate in a photo-stenciling process for registering, or aligning, phosphor dots on the faceplate's inner surface with electron beam passing apertures in the CRT's color selection electrode, or shadow mask. The optical aperture is elongated, with its longitudinal axis aligned generally transverse to the longitudinal axis of the mercury lamp, and is curvilinear having from two (2) to eight (8) inflection points along its length. The inflection points of the optical aperture, or the points along its length where it undergoes a slope reversal, direct the light beam through the shadow mask apertures and onto the CRT's faceplate in a manner which closely simulates electron beam trajectories under the influence of a self-convergent magnetic deflection yoke to correct for residual misregistration errors arising from the use of the self-convergent magnetic deflection yoke in the CRT. The unique shape of the optical aperture also reduces registration sensitivity of the light beam directed onto the faceplate, thus relaxing alignment tolerances and assembly precision of the light source and associated components.

Abstract translation: 在彩色阴极射线管（CRT）的制造中用作灯塔的装置包括具有盖透镜的壳体。 设置在壳体内的是包括圆柱形汞灯形式的光源和与汞灯紧密分开的光学孔的光源组件。 水银灯通过光学孔径以及通过盖子透镜将光通过光掩模过程引导到CRT玻璃面板的内表面上，用于在面板内表面上配准或对准荧光点，电子束通过孔 CRT的选色电极或荫罩。 光学孔是细长的，其纵向轴线大致横向于水银灯的纵向轴线，并且是曲线的，沿其长度具有两个（2）至八个（8）拐点。 光学孔径的拐点或其沿着其长度的点经历斜率反转，将光束通过阴影掩模孔并以其自身的影响紧密地模拟电子束轨迹的方式引导到CRT的面板上 - 会聚磁偏转线圈，用于校正在CRT中使用自会聚磁偏转线圈引起的残留对准误差。 光学孔径的独特形状也降低了被引导到面板上的光束的配准灵敏度，从而减轻了光源及相关组件的对准公差和组装精度。