公开(公告)号：US20140092372A1

公开(公告)日：2014-04-03

申请号：US14100127

申请日：2013-12-09

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

IPC: G03F7/20

CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

公开(公告)号：US08885146B2

公开(公告)日：2014-11-11

申请号：US14100127

申请日：2013-12-09

Applicant: 3M Innovative Properties Company

Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

IPC: G03B27/54 ,  G03B27/74 ,  G03F7/20

CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。