LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES
    3.
    发明申请
    LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES 审中-公开
    液体光电组合物和制造结构的方法

    公开(公告)号:US20160306277A1

    公开(公告)日:2016-10-20

    申请号:US15100577

    申请日:2014-12-01

    摘要: A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.

    摘要翻译: 制造结构的方法包括将液体光反应性组合物设置在基材上,将一部分液体光反应性组合物暴露于具有足够强度和波长的激光以通过双光子敏化剂的双光子激发引发聚合, 液体光反应性组合物的一部分由此提供暴露的组合物; 并显影曝光的组合物以提供结构。 液体组合物包括:至少一种可阳离子聚合的聚环氧化物; 至少一种包含可自由基聚合的基团的化合物; 有效量的双光子光引发剂体系,其中组分(a)与组分(b)的重量比为25:75至75:25,包括端值。 双光子光引发剂体系包括双光子敏化剂和芳族鎓盐。 液体光反应性组合物可以含有小于约1重量%的有机溶剂。

    Multiphoton Curing Methods Using Negative Contrast Compositions
    5.
    发明申请
    Multiphoton Curing Methods Using Negative Contrast Compositions 审中-公开
    使用负对比组合的多光子固化方法

    公开(公告)号:US20150030985A1

    公开(公告)日:2015-01-29

    申请号:US14378577

    申请日:2013-02-18

    IPC分类号: G03F7/20

    CPC分类号: G03F7/2053

    摘要: The present disclosure relates to multiphoton absorption methods for curing a photocurable composition under conditions wherein negative contrast occurs. The photocurable composition includes a free-radically polymerizable compound. The method is applicable to fabrication of structures with micron-scale dimensions or less.

    摘要翻译: 本发明涉及在发生负对比度的条件下固化可光固化组合物的多光子吸收方法。 光固化性组合物包含可自由基聚合的化合物。 该方法适用于具有微米级尺寸或更小尺寸的结构的制造。

    NOZZLE AND METHOD OF MAKING SAME
    6.
    发明申请

    公开(公告)号:US20180363613A1

    公开(公告)日:2018-12-20

    申请号:US16101775

    申请日:2018-08-13

    摘要: Nozzle and a method of making the same are disclosed. The method includes forming a material into a nozzle forming microstructured pattern comprising a plurality of nozzle hole forming features and planar control cavity forming features; forming at least one different material into a nozzle pre-form using the nozzle forming microstructured pattern, with the nozzle pre-form comprising a plurality of nozzle pre-form holes and sacrificial planar control cavities; and forming a nozzle from the nozzle pre-form, said forming the nozzle comprising removing enough of the at least one different material to remove the sacrificial planar control cavities so as to form a top surface of the nozzle pre-form into a top surface of the nozzle, and to form each of the nozzle pre-form holes into a nozzle through hole.

    Multi-photon exposure system
    10.
    发明授权
    Multi-photon exposure system 有权
    多光子曝光系统

    公开(公告)号:US08885146B2

    公开(公告)日:2014-11-11

    申请号:US14100127

    申请日:2013-12-09

    IPC分类号: G03B27/54 G03B27/74 G03F7/20

    摘要: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

    摘要翻译: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂,以及包括监测器的自动化系统,该监视器测量从垂直于光轴的平面中的功率,脉冲长度,形状,发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号,并且子系统响应于来自监视器的信号来调整光束。