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    Method and device for processing print data and for printing according to such print data
    1.
    发明授权
    Method and device for processing print data and for printing according to such print data 有权

    公开(公告)号：US11762300B2

    公开(公告)日：2023-09-19

    申请号：US17437273

    申请日：2020-03-06

    申请人： Mycronic AB

    发明人： Fredric Ihren

    IPC分类号： G03F7/20 ,  G03F7/00

    CPC分类号： G03F7/704 ,  G03F7/2053 ,  G03F7/70508

    摘要： A method for processing print data defining a pattern to be printed comprises obtaining (S10) of vector print data for the pattern to be printed. The vector print data is divided (S12) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S14) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.

    Exposure Optics and Device for Producing A Three-Dimensional Object
    2.
    发明申请
    Exposure Optics and Device for Producing A Three-Dimensional Object 审中-公开

    公开(公告)号：US20180314044A1

    公开(公告)日：2018-11-01

    申请号：US15771261

    申请日：2016-10-28

    申请人： EOS GmbH Electro Optical Systems

    发明人： Hans Perret ,  Stephan Gronenborn

    IPC分类号： G02B19/00 ,  B29C64/268 ,  B29C64/153 ,  B33Y30/00 ,  B22F3/105

    CPC分类号： G02B13/22 ,  B41J2/451 ,  G03F7/2053 ,  G03F7/2055 ,  G03F7/70416

    摘要： An exposure optics serves as an equipping and/or retrofitting optics for a device for producing a three-dimensional object by selectively solidifying building material, layer by layer. The exposure optics includes at least a first object-sided lens system having a first focal length f1 and a second image-sided lens system having a second focal length f2, which lens systems can be arranged in the beam path of the radiation emitted by the radiation source. The focal plane of the first lens system and the focal plane of the second lens system coincide in a plane between the two lens systems. The focal length f1 of the first lens system is equal to or greater than the focal length f2 of the second lens system. The exposure optics is designed and can be arranged such that the electromagnetic radiation is incident substantially perpendicular on the working surface.

    Display device
    7.
    发明授权
    Display device 有权

    公开(公告)号：US09753194B2

    公开(公告)日：2017-09-05

    申请号：US14596452

    申请日：2015-01-14

    申请人： Samsung Display Co., Ltd.

    发明人： Minsu Lee ,  Chul Huh

    IPC分类号： G02B5/22 ,  G02B5/20 ,  G02F1/1335 ,  G02B5/00 ,  G03F7/00 ,  G03F7/105 ,  G03F7/20 ,  H01L27/32

    CPC分类号： G02B5/201 ,  G02B5/008 ,  G02B5/223 ,  G02F1/133514 ,  G02F2202/36 ,  G03F7/0007 ,  G03F7/105 ,  G03F7/2053 ,  H01L27/322

    摘要： A display device includes a first substrate, and a second substrate opposing the first substrate and including a color filter layer. The color filter layer includes a red color filter, a green color filter and a blue color filter. The red color filter includes a first fluorescent dye and a first nanoparticle, and illustrates red color. The green color filter includes a second fluorescent dye and a second nanoparticle and illustrates green color. The blue color filter includes a third fluorescent dye and a third nanoparticle and illustrates blue color. Each of the first to third nanoparticles has a non-spherical shape and has maximum extinction at the first wavelength, the second wavelength and the third wavelength. The first wavelength is greater than the second wavelength, and the second wavelength is greater than the third wavelength.