OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME

    公开(公告)号:US20210271163A1

    公开(公告)日:2021-09-02

    申请号:US17256320

    申请日:2019-06-27

    Abstract: Provided are: an oxime ester compound that is useful as a photopolymerization initiator used in a polymerizable composition; and a photopolymerization initiator containing the oxime ester compound. The oxime ester compound contains, in the same molecule: a group represented by the following Formula (I); and a photoradical cleavable group containing no oxime ester group: wherein, R1 and R2 each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group or the like; one or more hydrogen atoms in the groups represented by R1 and R2 are optionally substituted with a halogen atom, a nitro group, a cyano group or the like; one or more methylene groups in the groups represented by R1 and R2 are optionally substituted with —O—, —CO—, —COO—, —OCO—, —NR3— or the like, provided that oxygen atoms are not arranged adjacent to one another; R3 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms; n represents 0 or 1; and * represents a bond.

    THERMAL ACID GENERATOR AND RESIST COMPOSITION USING SAME

    公开(公告)号:US20220197136A1

    公开(公告)日:2022-06-23

    申请号:US17691718

    申请日:2022-03-10

    Abstract: A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

    THERMAL ACID GENERATOR AND RESIST COMPOSITION USING SAME

    公开(公告)号:US20200183271A1

    公开(公告)日:2020-06-11

    申请号:US16071397

    申请日:2017-01-23

    Abstract: Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

Patent Agency Ranking