公开(公告)号：US20220137507A1

公开(公告)日：2022-05-05

申请号：US17425308

申请日：2020-01-22

Applicant: ADEKA CORPORATION

Inventor： Toshihiko MURAI ,  Shohei FUJITA ,  Junya MIYAKE ,  Izumi MATSUI ,  Konomi OTSUKA

IPC: G03F7/004 ,  C07C309/73 ,  C07C309/65 ,  G03F7/039 ,  G03F7/038

Abstract: A compound represented by formula (A) exhibits excellent balance between acid generation sensitivity and capability of providing a composition with reduced discoloration. In formula (A), R1, R11, R12, R13, R14, R15, R16, R17, and n are as defined in the description. R1 is preferably an optionally substituted aliphatic hydrocarbon group having 1 to 20 carbon atoms or an optionally substituted aromatic hydrocarbon group having 6 to 20 carbon atoms.

公开(公告)号：US20190391490A1

公开(公告)日：2019-12-26

申请号：US16465113

申请日：2017-11-29

Applicant: ADEKA CORPORATION

Inventor： Taiki MIHARA ,  Junya MIYAKE ,  Naomi SATO

IPC: G03F7/027 ,  C08K5/42 ,  C08L61/28 ,  C08L25/04 ,  C08L33/04 ,  G03F7/038 ,  G03F7/20

Abstract: Provided are: a negative photosensitive composition which exhibits excellent sensitivity at the time of being cured and yields a cured article having excellent heat resistance; a cured article thereof; and a method of curing the same. The negative photosensitive composition contains: a sulfonic acid derivative compound (A) represented by Formula (I) below where X1 represents a linear or branched alkyl group having 1 to 14 carbon atoms or the like; R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like; and the aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like has no substituent or is optionally substituted with a halogen atom or a group selected from a halogenated alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 18 carbon atoms and an alkylthio group having 1 to 18 carbon atoms; a crosslinkable functional group-containing polymer compound (B); and a crosslinking agent (C):

公开(公告)号：US20220197136A1

公开(公告)日：2022-06-23

申请号：US17691718

申请日：2022-03-10

Applicant: ADEKA CORPORATION

Inventor： Junya MIYAKE ,  Yoshitomo TAKEUCHI ,  Naomi SATO ,  Kentaro KIMURA

IPC: G03F7/004 ,  C07D221/14

Abstract: A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

公开(公告)号：US20200183271A1

公开(公告)日：2020-06-11

申请号：US16071397

申请日：2017-01-23

Applicant: ADEKA CORPORATION

Inventor： Junya MIYAKE ,  Yoshitomo TAKEUCHI ,  Naomi SATO ,  Kentaro KIMURA

IPC: G03F7/004 ,  C07D221/14

Abstract: Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

公开(公告)号：US20190294044A1

公开(公告)日：2019-09-26

申请号：US16465097

申请日：2017-11-29

Applicant: ADEKA CORPORATION

Inventor： Taiki MIHARA ,  Junya MIYAKE ,  Naomi SATO

IPC: G03F7/039 ,  G03F7/004

Abstract: Provided are: a positive photosensitive composition that exhibits excellent sensitivity at a time of being cured; a pattern using the same; and a method of producing a pattern. The positive photosensitive composition contains: a sulfonic acid derivative compound (A) represented by Formula (I) below, where X1 represents a linear or branched alkyl group having 1 to 14 carbon atoms or the like; and R1 represents a group represented by an aliphatic hydrocarbon group, an aryl group, an arylalkyl group, an acyl group-substituted aryl group, an alicyclic hydrocarbon group or the like, which aliphatic hydrocarbon group, aryl group or arylalkyl group has no substituent or is optionally substituted with a halogen atom or the like; and a polymer compound (B) required to contain a structural unit represented by Formula (III) below, where R5 represents a hydrogen atom or a methyl group; R6 represents an alkyl group having 1 to 4 carbon atoms or the like; f represents a number of 0 to 4; and symbols “*” mean that this group is bound with adjacent groups at the sites “*”: