公开(公告)号：US20170166575A1

公开(公告)日：2017-06-15

申请号：US15129630

申请日：2015-03-30

Applicant: ADEKA CORPORATION

Inventor： Yoko KOMIYAMA ,  Takeo OISHI ,  Tomoyuki ARIYOSHI ,  Tomoya TAMACHI ,  Takayuki IKAGA ,  Naomi SATO

IPC: C07D487/06 ,  C07D401/04 ,  C07D409/04 ,  G03F7/031 ,  C07D471/04 ,  C07D209/60 ,  C07D409/10 ,  C07D209/14 ,  C07D405/04

CPC classification number: C07D487/06 ,  C07D209/14 ,  C07D209/56 ,  C07D209/60 ,  C07D401/04 ,  C07D405/04 ,  C07D409/04 ,  C07D409/10 ,  C07D471/04 ,  C08F2/50 ,  G03F7/031 ,  G03F7/032 ,  G03F7/0388

Abstract: The present invention provides oxime ester compounds represented by general formula (I), a photopolymerization initiator using said compound, and a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing same, and cured products thereof. The compounds of the present invention have excellent stability and low sublimability, and are useful as highly sensitive photopolymerization initiators that are activated by efficiently absorbing near ultraviolet light of 365 nm, etc. (I) (See the Specification for the definitions of R1-R8 in the formula. n represents 0 or 1.)

公开(公告)号：US20190294044A1

公开(公告)日：2019-09-26

申请号：US16465097

申请日：2017-11-29

Applicant: ADEKA CORPORATION

Inventor： Taiki MIHARA ,  Junya MIYAKE ,  Naomi SATO

IPC: G03F7/039 ,  G03F7/004

Abstract: Provided are: a positive photosensitive composition that exhibits excellent sensitivity at a time of being cured; a pattern using the same; and a method of producing a pattern. The positive photosensitive composition contains: a sulfonic acid derivative compound (A) represented by Formula (I) below, where X1 represents a linear or branched alkyl group having 1 to 14 carbon atoms or the like; and R1 represents a group represented by an aliphatic hydrocarbon group, an aryl group, an arylalkyl group, an acyl group-substituted aryl group, an alicyclic hydrocarbon group or the like, which aliphatic hydrocarbon group, aryl group or arylalkyl group has no substituent or is optionally substituted with a halogen atom or the like; and a polymer compound (B) required to contain a structural unit represented by Formula (III) below, where R5 represents a hydrogen atom or a methyl group; R6 represents an alkyl group having 1 to 4 carbon atoms or the like; f represents a number of 0 to 4; and symbols “*” mean that this group is bound with adjacent groups at the sites “*”:

公开(公告)号：US20190391490A1

公开(公告)日：2019-12-26

申请号：US16465113

申请日：2017-11-29

Applicant: ADEKA CORPORATION

Inventor： Taiki MIHARA ,  Junya MIYAKE ,  Naomi SATO

IPC: G03F7/027 ,  C08K5/42 ,  C08L61/28 ,  C08L25/04 ,  C08L33/04 ,  G03F7/038 ,  G03F7/20

Abstract: Provided are: a negative photosensitive composition which exhibits excellent sensitivity at the time of being cured and yields a cured article having excellent heat resistance; a cured article thereof; and a method of curing the same. The negative photosensitive composition contains: a sulfonic acid derivative compound (A) represented by Formula (I) below where X1 represents a linear or branched alkyl group having 1 to 14 carbon atoms or the like; R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like; and the aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like has no substituent or is optionally substituted with a halogen atom or a group selected from a halogenated alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 18 carbon atoms and an alkylthio group having 1 to 18 carbon atoms; a crosslinkable functional group-containing polymer compound (B); and a crosslinking agent (C):

公开(公告)号：US20210271163A1

公开(公告)日：2021-09-02

申请号：US17256320

申请日：2019-06-27

Applicant: ADEKA CORPORATION

Inventor： Yoshitomo TAKEUCHI ,  Taiki MIHARA ,  Naomi SATO ,  Kazushi MATSUKAWA

IPC: G03F7/031 ,  G03F7/00 ,  G02B5/22 ,  C08F2/50

Abstract: Provided are: an oxime ester compound that is useful as a photopolymerization initiator used in a polymerizable composition; and a photopolymerization initiator containing the oxime ester compound. The oxime ester compound contains, in the same molecule: a group represented by the following Formula (I); and a photoradical cleavable group containing no oxime ester group: wherein, R1 and R2 each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group or the like; one or more hydrogen atoms in the groups represented by R1 and R2 are optionally substituted with a halogen atom, a nitro group, a cyano group or the like; one or more methylene groups in the groups represented by R1 and R2 are optionally substituted with —O—, —CO—, —COO—, —OCO—, —NR3— or the like, provided that oxygen atoms are not arranged adjacent to one another; R3 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms; n represents 0 or 1; and * represents a bond.

公开(公告)号：US20220197136A1

公开(公告)日：2022-06-23

申请号：US17691718

申请日：2022-03-10

Applicant: ADEKA CORPORATION

Inventor： Junya MIYAKE ,  Yoshitomo TAKEUCHI ,  Naomi SATO ,  Kentaro KIMURA

IPC: G03F7/004 ,  C07D221/14

Abstract: A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

公开(公告)号：US20200183271A1

公开(公告)日：2020-06-11

申请号：US16071397

申请日：2017-01-23

Applicant: ADEKA CORPORATION

Inventor： Junya MIYAKE ,  Yoshitomo TAKEUCHI ,  Naomi SATO ,  Kentaro KIMURA

IPC: G03F7/004 ,  C07D221/14

Abstract: Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).