-
1.
公开(公告)号:US20230128396A1
公开(公告)日:2023-04-27
申请号:US18069624
申请日:2022-12-21
Applicant: AGC Inc.
Inventor: Masatoshi ABE , Mizuna TOYODA , Tsuyoshi KAWAI , Shotaro BEPPU
IPC: C09D127/18 , C09D7/20 , C08F214/26 , C08F210/06 , C08F2/38 , C08K5/14 , C08K5/29 , C08J3/24 , C08J3/28
Abstract: A coating material of the present invention is a coating material containing: a fluorine-containing polymer having at least one of an iodine atom and a bromine atom; and a solvent, wherein a storage elastic modulus G′ of the fluorine-containing polymer is less than 360 kPa, and a total light transmittance of a mixed liquid obtained by mixing and stirring the fluorine-containing polymer and the solvent contained in the coating material is 1.0% or more, the mixed liquid being left to stand for 3 days, stirred again, and left to stand for 30 minutes to measure the total light transmittance.
-
2.
公开(公告)号:US20220372186A1
公开(公告)日:2022-11-24
申请号:US17817132
申请日:2022-08-03
Applicant: AGC Inc.
Inventor: Takefumi ABE , Kaori TSURUOKA , Tetsuji SHIMOHIRA , Saki TAKEI , Shotaro BEPPU
IPC: C08F214/26 , H01L51/00
Abstract: A fluorinated polymer suitable for deposition is provided. A film containing such a fluorinated polymer as a material is provided. A method for producing a film, by which such a film can readily be produced, is provided. Further, an organic photoelectronic element having such a film in its structure is provided.
A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is 200° C. or higher, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 100° C.-
公开(公告)号:US20220372180A1
公开(公告)日:2022-11-24
申请号:US17817168
申请日:2022-08-03
Applicant: AGC Inc.
Inventor: Takefumi ABE , Kaori TSURUOKA , Tetsuji SHIMOHIRA , Saki TAKEI , Shotaro BEPPU
Abstract: A fluorinated polymer suitable for deposition and capable of favorable metal patterning, is provided. A resin film containing such a fluorinated polymer as a material is provided. Further, a photoelectronic element having such a resin film in its structure is provided.
A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is less than 200° C., or no melting point is observed, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.
-
-