公开(公告)号：US20160172168A1

公开(公告)日：2016-06-16

申请号：US14616895

申请日：2015-02-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Keith A. Miller ,  THANH X. NGUYEN ,  ILYA LAVITSKY ,  RANDY SCHMIEDING ,  PRASHANTH KOTHNUR

IPC: H01J37/34

CPC classification number: H01J37/3452 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/352 ,  H01J37/3408 ,  H01J37/3417 ,  H01J37/3467

Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.

Abstract translation: 本文提供介电材料的物理气相沉积设备。 在一些实施例中，物理气相沉积室的室盖包括耦合到内部目标组件的内部磁控管组件和联接到外部目标组件的外部磁体组件，其中内部磁控管组件和内部目标组件被电隔离 从外部磁体组件和外部目标组件。