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公开(公告)号：US20250092577A1
公开(公告)日：2025-03-20
申请号：US18292271
申请日：2022-07-25
Applicant: ARKEMA FRANCE
Inventor： Quentin PINEAU , Ludovic LUCE , Sébastien Jun MOUGNIER
Abstract: The invention relates to an elastic filament comprising a copolymer containing polyamide blocks and polyether blocks, —the polyamide blocks being chosen from PA 11, PA 12, PA 1010, PA 1012, PA 1014, the copolymer thereof and the mixture thereof, —the polyether blocks being blocks derived from polytetramethylene glycol having a weight-average molecular mass of between 500 and 3000 g/mol, —the enthalpy of fusion of the copolymer being between 15 and 50 J/g.
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公开(公告)号：US20230391059A1
公开(公告)日：2023-12-07
申请号：US18250656
申请日：2021-10-27
Applicant: ARKEMA FRANCE
Inventor： Quentin PINEAU , Charlotte HERDT , Sébastien Jun MOUGNIER
IPC: B32B27/12 , B32B5/02 , B32B27/34 , B32B27/28 , B32B7/12 , B32B27/18 , B32B37/12 , B32B27/08 , B32B37/18
CPC classification number: B32B27/12 , B32B5/02 , B32B27/34 , B32B27/285 , B32B7/12 , B32B27/18 , B32B37/1207 , B32B27/08 , B32B37/182 , B32B2262/0261 , B32B2307/7376 , B32B2307/4026 , B32B2307/3065 , B32B2272/00 , B32B2037/1223 , B32B2305/18 , B32B2307/7246
Abstract: The invention relates to a multilayer structure comprising a textile layer comprising at least one polymer chosen from a polyamide and a copolymer containing polyamide blocks and polyether blocks, and combinations thereof; and a film comprising at least one copolymer containing polyamide blocks and polyether blocks, the polyether blocks comprising polyethylene glycol blocks, the polyethylene glycol blocks representing at least 40% by mass relative to the mass of the film; in which the film adheres to the textile layer via a copolyamide.
The invention also relates to a process for manufacturing said multilayer structure, to a process for recycling said multilayer structure and also to an article comprising said multilayer structure.
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