公开(公告)号：US20220214622A1

公开(公告)日：2022-07-07

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan NATH ,  Kalyan Kumar MANKALA ,  Todd R. DOWNEY ,  Joseph Harry LYONS ,  Ozer UNLUHISARCIKLI ,  Alexander Harris LEDBETTER ,  Nicholas Stephen APONE ,  Tian GANG

IPC: G03F7/20

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.