公开(公告)号：US11243476B2

公开(公告)日：2022-02-08

申请号：US17050149

申请日：2019-03-27

Applicant: ASML Netherlands B.V.

Inventor： Ringo Petrus Cornelis Van Dorst ,  Gijs Kramer ,  Benjamin Cunnegonda Henricus Smeets ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

公开(公告)号：US11914307B2

公开(公告)日：2024-02-27

申请号：US17433897

申请日：2020-01-28

Applicant: ASML Netherlands B.V.

Inventor： Bas Johannes Petrus Roset ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Benjamin Cunnegonda Henricus Smeets

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70483 ,  G03F7/70653 ,  G03F7/706835 ,  G03F9/7034

Abstract: The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.

公开(公告)号：US10551746B2

公开(公告)日：2020-02-04

申请号：US15774165

申请日：2016-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Benjamin Cunnegonda Henricus Smeets ,  Mark Constant Johannes Baggen

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.