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公开(公告)号：US20240069454A1
公开(公告)日：2024-02-29
申请号：US18280266
申请日：2022-02-21
发明人： Cristina CARESIO , Tabitha Wangari KINYANJUI , Andrey Valerievich ROGACHEVSKIY , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Raymund CENTENO , Jan Arie DEN BOER , Viktor TROGRLIC
IPC分类号： G03F9/00
CPC分类号： G03F9/7034 , G03F9/7092
摘要： A method of processing a data set including equispaced and/or non-equispaced data samples is disclosed. The method includes filtering of the data, wherein a kernel defined by a probability density function is convoluted over samples in the data set to perform a weighted average of the samples at a plurality of positions across the data set, and wherein a first order regression is applied to the filtered data to provide a processed data output.
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公开(公告)号：US11914307B2
公开(公告)日：2024-02-27
申请号：US17433897
申请日：2020-01-28
发明人： Bas Johannes Petrus Roset , Johannes Hendrik Everhardus Aldegonda Muijderman , Benjamin Cunnegonda Henricus Smeets
CPC分类号： G03F7/70725 , G03F7/70483 , G03F7/70653 , G03F7/706835 , G03F9/7034
摘要： The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.
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公开(公告)号：US20240061314A1
公开(公告)日：2024-02-22
申请号：US18373421
申请日：2023-09-27
CPC分类号： G02F1/3528 , G03F9/7034 , H01S3/0057 , H01S3/06741
摘要： A supercontinuum radiation source including a modulator being operable to modulate pump laser radiation including a train of radiation pulses to provide modulated pump laser radiation, the modulation being such to selectively provide a burst of the pulses; and a hollow-core photonic crystal fiber being operable to receive the modulated pump laser radiation and excite a working medium contained within the hollow-core photonic crystal fiber so as to generate supercontinuum radiation.
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公开(公告)号：US20230384698A1
公开(公告)日：2023-11-30
申请号：US18032448
申请日：2021-09-20
申请人： ASML Netherlands BV.
CPC分类号： G03F9/7034 , G03F7/70725
摘要： A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the substrate; a projection system configured to pattern the substrate with fields aligned in a scanning exposure direction; a level sensor configured to sense a height of the substrate using a plurality of measurement spots; and a controller configured to control the actuators to generate strokes of relative movement between the substrate and the level sensor for mapping the height of the substrate, said strokes being at an angle of less than 20 degrees relative to the scanning exposure direction. Also disclosed is an associated method of mapping the height of a substrate.
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公开(公告)号：US20170351185A1
公开(公告)日：2017-12-07
申请号：US15541347
申请日：2015-12-27
发明人： Jingchao QI , Feibiao CHEN
CPC分类号： G03F7/70641 , G01B11/0608 , G01B11/26 , G03F9/7026 , G03F9/7034
摘要： Disclosed is an adaptive groove focusing and leveling device for measuring the height and the inclination of the surface of a measured object (400). The measured object (400) is provided with cyclic grooves (401) in the surface and supported by a moving table; the focusing and leveling device sequentially comprises an illumination unit, a projection unit, a detection unit and a detector (212); the measured object (400) is positioned between the projection unit and the detection unit along the light path, the projection unit comprises a projection slit (203) and is used for forming a plurality of measuring points (501) on the measured object (400), and each measuring point (501) comprises at least three measuring child light spots (502), wherein the at least three measuring child light spots (502) are arranged at unequal intervals, so that when the plurality of measuring points (501) are projected to the surface of the measured object (400), at least two of the at least three measuring child light spots (502) of each measuring point (501) can be positioned outside the grooves (401), and then the height and the inclination of the surface of the measured object (400) are measured.
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公开(公告)号：US20170329236A1
公开(公告)日：2017-11-16
申请号：US15669661
申请日：2017-08-04
申请人： NIKON CORPORATION
CPC分类号： G03F7/70725 , G01D5/34715 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F9/7026 , G03F9/7034 , G03F9/7049 , H02K41/031 , H02K2201/18
摘要： A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.
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公开(公告)号：US20170184980A1
公开(公告)日：2017-06-29
申请号：US15325048
申请日：2015-06-09
发明人： Erik Willem BOGAART
CPC分类号： G03F7/70525 , G03F7/70508 , G03F7/70633 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
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公开(公告)号：US09606442B2
公开(公告)日：2017-03-28
申请号：US14418373
申请日：2013-07-16
CPC分类号： G03F7/70141 , G03F9/7026 , G03F9/7034
摘要： An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination profile across a pupil of the apparatus, an objective lens for forming a spot of radiation on a mark using radiation supplied by said illumination arrangement, a radiation processing element for processing radiation that is diffracted by the mark, a first detection arrangement for detecting variations in an intensity of radiation output by the radiation processing element and for calculating therefrom a position of the mark, an optical arrangement, a second detection arrangement, wherein the optical arrangement serves to direct diffracted radiation to the second detection arrangement, and wherein the second detection arrangement is configured to detect size and/or position variations in the radiation and to calculate therefrom a defocus and/or local tilt of the mark.
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9.发明授权Surface positioning detecting apparatus, exposure apparatus and device manufacturing method 有权表面定位检测装置，曝光装置及装置的制造方法公开(公告)号：US09594316B2
公开(公告)日：2017-03-14
申请号：US13848463
申请日：2013-03-21
申请人： NIKON CORPORATION
发明人： Yasuhiro Hidaka
CPC分类号： G03F9/7065 , G01B11/14 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A surface position detecting apparatus includes a light projection system that projects a beam from an oblique direction onto a detection target surface, and a light reception system that receives a beam reflected on the detection target surface, said surface position detecting apparatus adapted to detect a surface position of the detection target surface based on an output from the light reception system. At least one of the light projection system and the light reception system includes a total reflection prism member including an internal reflection surface which totally reflects an incident beam. Upon detection of the surface position of the detection target surface, a refractive index of an optical material forming the total reflection prism member and an angle of incidence of the incident beam to the internal reflection surface of the total reflection prism member are set so as to satisfy a predetermined relation.
摘要翻译： 表面位置检测装置包括将倾斜方向的光束投射到检测对象面上的光投射系统和接受在检测对象面上反射的光束的光接收系统，所述表面位置检测装置适于检测表面 基于来自光接收系统的输出的检测对象面的位置。 光投射系统和光接收系统中的至少一个包括全反射棱镜构件，其包括全反射入射光束的内反射面。 在检测到目标表面的表面位置时，形成全反射棱镜部件的光学材料的折射率和入射光束与全反射棱镜部件的内反射面的入射角度被设定为 满足预定关系。
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10.发明授权公开(公告)号：US09519223B2
公开(公告)日：2016-12-13
申请号：US14712504
申请日：2015-05-14
申请人： NIKON CORPORATION
发明人： Yasuhiro Hidaka , Tadashi Nagayama
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
摘要翻译： 一种表面位置检测装置，其能够高度精确地检测待检测表面的表面位置，而不会受到通过反射表面的光束中产生的偏振分量的相对位置偏移的影响。 在该装置中，投影系统具有具有第一反射面的突出侧棱镜部件，并且受光系统具有受光棱镜部件，该受光棱镜部件具有与突出侧棱镜部件对应地配置的第二反射面。 表面位置检测装置还具有用于补偿由于通过第一和第二反射面的光束的偏振分量引起的相对位移的构件。
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