METHOD OF DESIGNING LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMER
    1.
    发明申请
    METHOD OF DESIGNING LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMER 审中-公开
    自组装嵌段共聚物设计光刻特征的方法

    公开(公告)号:US20160178999A1

    公开(公告)日:2016-06-23

    申请号:US14909057

    申请日:2014-07-09

    Abstract: A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.

    Abstract translation: 一种用于可自组装嵌段共聚物特征的设计或验证方法,所述嵌段共聚物特征包括具有第一聚合物类型的第一结构域和具有第二聚合物类型的第二结构域,所述方法包括基于第二聚合物的长度 类型或基于第二聚合物类型的长度计算的嵌段共聚物特征中的第一结构域的不确定性,调节嵌段共聚物特征的自组装过程的参数或验证嵌段共聚物特征的放置 。

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