公开(公告)号：US20230054421A1

公开(公告)日：2023-02-23

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20170192359A1

公开(公告)日：2017-07-06

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Niek Elout DE KRUIJF ,  Mircea DUSA ,  Martijn HOUBEN ,  Johannes Gerardus Maria MULDER ,  Thomas POIESZ ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Paul VAN DONGEN ,  Justin Johannes Hermanus GERRITZEN ,  Antonie Hendrik VER WEIJ ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20220057722A1

公开(公告)日：2022-02-24

申请号：US17519713

申请日：2021-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20160187791A1

公开(公告)日：2016-06-30

申请号：US15021240

申请日：2014-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Martijn HOUBEN ,  Alwin DE KOCK ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Marco Adrianus Peter VAN DEN HEUVEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.

Abstract translation: 一种用于支撑基板表面的支撑台，其中所述支撑台包括：基本平行于所述基板的表面的基面，在所述基面上方突出的多个毛刺，每个所述毛坯具有相应的远端和 所述毛坯被布置成使得当所述基底由所述支撑台支撑时，所述基底由相应的远端支撑，以及由间隙分开的多个细长凸起突起，每个所述细长凸起突起 在所述基面上方具有第二高度，其中所述细长凸起突起突出在所述孔之间的所述基面之上，并且所述第二高度小于所述第一高度; 其中所述突起被布置成使得多个间隙对准以形成朝向所述基部表面的边缘的直的气体流动路径。

公开(公告)号：US20230176487A1

公开(公告)日：2023-06-08

申请号：US17922580

申请日：2021-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Sebastiaan GILIJAMSE ,  Johan Gertrudis Cornelis KUNNEN ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Boogyeong Zoo

IPC: G03F7/20

CPC classification number: G03F7/70533 ,  G03F7/7085 ,  G03F7/70783

Abstract: A substrate support system is provided that includes: a support part configured to support a bottom surface of a substrate on a support plane; a moveable part moveable between a retracted position, in which a top end of the moveable part is below the support plane, and an extended position, in which the top end of the moveable part is above the support plane, such that the top end supports the bottom surface of the substrate above the support plane in the extended position; and a measurement system configured to measure a time taken for the moveable part to move from the retracted position to the extended position, to compare the measured time with a reference time, and to generate a signal when the measured time deviates from the reference time by more than a predetermined amount.

公开(公告)号：US20210132510A1

公开(公告)日：2021-05-06

申请号：US16617242

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanns GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.