公开(公告)号：US11460784B2

公开(公告)日：2022-10-04

申请号：US17272505

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Venugopal Vellanki ,  Mark Christopher Simmons

IPC: G03F7/20

Abstract: A method of determining candidate patterns from a set of patterns of a patterning process. The method includes obtaining (i) a set of patterns of a patterning process, (ii) a search pattern having a first feature and a second feature, and (iii) a search condition comprising a relative position between the first feature and the second feature of the search pattern; and determining a set of candidate patterns from the set of patterns that satisfies the search condition associated with the first feature and the second feature of the search pattern.

公开(公告)号：US10896282B2

公开(公告)日：2021-01-19

申请号：US16316465

申请日：2017-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Taksh Pandey ,  Mark Christopher Simmons

IPC: G06F17/50 ,  G06F30/398 ,  G03F1/36 ,  G03F7/20

Abstract: A process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.