公开(公告)号：US10754256B2

公开(公告)日：2020-08-25

申请号：US15763387

申请日：2016-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas I. Wallow ,  Peng-cheng Yang ,  Adam Lyons ,  Mir Farrokh Shayegan Salek ,  Hermanus Adrianus Dillen

IPC: G03F7/20 ,  G03F1/36

Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.