公开(公告)号：US20240061353A1

公开(公告)日：2024-02-22

申请号：US18270988

申请日：2021-12-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Hendrik Celine VAN GORP ,  Stephan VAN REENEN

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F9/7026 ,  G03F7/70641 ,  G03F7/706845 ,  G03F9/7092

Abstract: A method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus in control of a lithographic exposure process for exposure of an exposure area including at least two topographical levels. The method includes determining a continuous single focus actuation profile for the at least two topographical levels from an objective function including a per-level component operable to optimize a focus metric per topographical level for each of the at least two topographical levels.