公开(公告)号：US11768440B2

公开(公告)日：2023-09-26

申请号：US18089007

申请日：2022-12-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/20 ,  G03F7/00 ,  G06N20/00 ,  G06N5/047

CPC classification number: G03F7/70441 ,  G03F7/705 ,  G06N5/047 ,  G06N20/00

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US11561477B2

公开(公告)日：2023-01-24

申请号：US16640500

申请日：2018-09-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/20 ,  G06N20/00 ,  G06N5/04

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US20210271172A1

公开(公告)日：2021-09-02

申请号：US17176559

申请日：2021-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ya Luo ,  Yu Cao ,  Jen-Shiang Wang ,  Yen-Wen Lu

IPC: G03F7/20 ,  G06N20/00 ,  G06K9/62 ,  G06N20/10

Abstract: Methods of determining, and using, a process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.

公开(公告)号：US12204250B2

公开(公告)日：2025-01-21

申请号：US18233365

申请日：2023-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/00 ,  G06N5/047 ,  G06N20/00

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US20230137097A1

公开(公告)日：2023-05-04

申请号：US18089007

申请日：2022-12-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/20 ,  G06N20/00 ,  G06N5/047

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US20240012335A1

公开(公告)日：2024-01-11

申请号：US18233365

申请日：2023-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/00 ,  G06N20/00 ,  G06N5/047

CPC classification number: G03F7/70441 ,  G06N20/00 ,  G03F7/705 ,  G06N5/047

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US10996565B2

公开(公告)日：2021-05-04

申请号：US16483452

申请日：2018-02-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Peng Liu ,  Ya Luo ,  Yu Cao ,  Yen-Wen Lu

IPC: G03F7/20 ,  G06F30/392 ,  G06N3/08 ,  G06F30/39

Abstract: A method including: obtaining a characteristic of a portion of a design layout; determining a characteristic of M3D of a patterning device including or forming the portion; and training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and whose supervisory signal includes the characteristic of the M3D. Also disclosed is a method including: obtaining a characteristic of a portion of a design layout; obtaining a characteristic of a lithographic process that uses a patterning device including or forming the portion; determining a characteristic of a result of the lithographic process; training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and the characteristic of the lithographic process, and whose supervisory signal includes the characteristic of the result.

公开(公告)号：US10948831B2

公开(公告)日：2021-03-16

申请号：US16484186

申请日：2018-02-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Ya Luo ,  Yu Cao ,  Jen-Shiang Wang ,  Yen-Wen Lu

IPC: G03F7/20 ,  G06N20/00 ,  G06K9/62 ,  G06N20/10

Abstract: Methods of determining, and using, a patterning process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.