公开(公告)号：US20180356736A1

公开(公告)日：2018-12-13

申请号：US15772432

申请日：2016-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander Alexandrovich DANILIN

IPC: G03F7/20

CPC classification number: G03F7/70516 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70633

Abstract: Measurement data is obtained for calibration fields that have been exposed by a lithographic apparatus using different field layouts and exposure sequences. The measurement data is classified in subsets by scan direction, step direction, field size and other variables. The measurement data is indexed by a time value that varies through each exposure sequence. Time values within different exposure sequences can be related using a normalized time value based on the beginning and end of each exposure sequence. An inter-field performance model is calculated for each subset. An intra-field component of a performance model is calculated with time as a third dimension. The time-indexed performance model is used to determine intra-field corrections for a variety of product exposures having product layouts and product exposure sequences different to the calibration fields, based on time and other a variables of the product layout and product exposure sequence.

公开(公告)号：US20250021017A1

公开(公告)日：2025-01-16

申请号：US18704532

申请日：2022-10-12

Applicant: ASML Netherlands B.V.

Inventor： Raaja Ganapathy SUBRAMANIAN ,  Bearrach MOEST ,  Alexander Alexandrovich DANILIN ,  Rowin MEIJERINK ,  Tim Izaak Johannes GOOSSEN ,  Stanislav Markovich SHUMIACHER

IPC: G03F7/00

Abstract: A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an initial temperature of the reticle to a predetermined temperature, reducing stress in the reticle to reduce parasitic thermal effects, calibrating a reticle heating model by exposing the reticle and a non-production substrate to a dose of radiation, and processing a production substrate by exposing the reticle and a production substrate to a dose of radiation based on the reticle heating model. The method can increase calibration accuracy and speed of the reticle heating model, reduce conditioning times of the reticle, reduce stress in the reticle, avoid rework of production substrates, and increase throughput, yield, and accuracy.