公开(公告)号：US20240036480A1

公开(公告)日：2024-02-01

申请号：US18258521

申请日：2021-12-09

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Hui Quan LIM ,  Amanda Elizabeth ANDERSON

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70683 ,  G03F7/70633 ,  G03F9/7088 ,  G03F9/7076

Abstract: Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.