公开(公告)号：US20240184215A1

公开(公告)日：2024-06-06

申请号：US18286327

申请日：2022-03-23

申请人： ASML Netherlands B.V.

发明人： Jin LIAN ,  Armand Eugene Albert KOOLEN ,  Sebastianus Adrianus GOORDEN ,  Hui Quan LIM

IPC分类号： G03F7/00

CPC分类号： G03F7/70516 ,  G03F7/70025 ,  G03F7/70633

摘要： Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.

公开(公告)号：US20240036480A1

公开(公告)日：2024-02-01

申请号：US18258521

申请日：2021-12-09

申请人： ASML Netherlands B.V.

发明人： Armand Eugene Albert KOOLEN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Hui Quan LIM ,  Amanda Elizabeth ANDERSON

IPC分类号： G03F7/00 ,  G03F9/00

CPC分类号： G03F7/70683 ,  G03F7/70633 ,  G03F9/7088 ,  G03F9/7076

摘要： Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.

公开(公告)号：US20230176491A1

公开(公告)日：2023-06-08

申请号：US17923913

申请日：2021-04-21

申请人： ASML Netherlands B.V.

发明人： Olger Victor ZWIER ,  Maurits VAN DER SCHAAR ,  Hilko Dirk BOS ,  Hans VAN DER LAAN ,  S.M. Masudur Rahman AL ARIF ,  Henricus Wilhelmus Maria Van Buel ,  Armand Eugene Albert KOOLEN ,  Victor CALADO ,  Kaustuve BHATTACHARYYA ,  Jin LIAN ,  Sebastianus Adrianus GOORDEN ,  Hui Quan LIM

IPC分类号： G03F7/20

CPC分类号： G03F7/70641 ,  G03F7/70558 ,  G03F7/70633 ,  G03F7/70625

摘要： Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.