-
公开(公告)号:US20160029471A1
公开(公告)日:2016-01-28
申请号:US14874164
申请日:2015-10-02
Applicant: ASML Netherlands B.V.
Inventor: Yezheng Tao , Robert Jay Rafac , Igor Vladimirovich Fomenkov , Daniel John William Brown , Daniel James Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
-
公开(公告)号:US09462668B2
公开(公告)日:2016-10-04
申请号:US14874164
申请日:2015-10-02
Applicant: ASML Netherlands B.V.
Inventor: Yezheng Tao , Robert Jay Rafac , Igor Vladimirovich Fomenkov , Daniel John William Brown , Daniel James Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
-